NOTICE OF INTENT TO SOLE SOURCE: RIE05-Electrical Static Chuck Based Deep Reactive Ion Etching System
Awarded Award Notice Posted
- Solicitation number
- NB680000-23-00600
- Agency
- National Institute of Standards and Technology Department of Commerce
- Awarded
- to KLA Corporation
- Set-aside
- No set-aside
Opportunity facts
- Contract number
- 1333ND23PNB680281 Federal contract award
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- PSC
- 6640 Laboratory Equipment And Supplies
- Place of performance
- Gaithersburg, Maryland 20899, United States
Notice details come from SAM.gov. Updated .
About this opportunity
This Award Notice from the Department of Commerce National Institute of Standards and Technology announces a sole source contract awarded to KLA Corporation for an electrical static chuck based deep reactive ion etching system. The firm fixed price contract, valued at $1,713,660, was awarded on September 20, 2023 under contract number 1333ND23PNB680281 to provide one electrical static chuck based deep reactive ion etching system to the agency.
Notice text
This contract action was both firm fixed priced and sole source under SAP.
Awarded contract 1333ND23PNB680281 to KLA Corporation for 1713660.00 on 2023-09-20.
Notice history
| Notice | Type | Posted |
|---|---|---|
| NOTICE OF INTENT TO SOLE SOURCE: RIE05-Electrical Static Chuck Based Deep Reactive Ion Etching System | Award Notice | |
| HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System | Limited / Sole Source Justification | |
| HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System | Award Notice | |
| NOTICE OF INTENT TO SOLE SOURCE: RIE05-Electrical Static Chuck Based Deep Reactive Ion Etching System | Special Notice | |
| NOTICE OF INTENT TO SOLE SOURCE: Plasma-Therm LLC HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System | Special Notice | |
| Inductively Coupled Plasma Reactive Ion Etcher for Etching Silicon with Hydrogen Bromide and Chlorine | Pre-Solicitation |
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