This is a firm-fixed-price purchase order awarded by the National Institute of Standards and Technology (NIST), a civilian federal agency, to KLA Corporation, a global technology company specializing in semiconductor manufacturing equipment. The contract is for the procurement of an electrical static chuck-based deep reactive ion etching system with a 4-year service agreement. The total ceiling value of the contract is $1,713,660.00, and the ultimate completion date is February 25, 2030.
The original sources sought notice provided details on the key requirements for the etching system, including the need for a load-lock, process chamber compatible with reactive chemicals, ICP and RIE electrodes, pumping system, software, safety interlocks, and compatibility with 200mm and 300mm wafer sizes and carriers. The notice sought responses from potential suppliers on their equipment specifications, manufacturing capabilities, customization options, terms and conditions, pricing, and references. This contract award appears to be the result of that sources sought process, though the original solicitation did not have a set-aside designation.
Generated 4/22/25, 10:48 AM