HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System
Awarded Award Notice Posted
- Solicitation number
- NB680000-23-00677
- Agency
- National Institute of Standards and Technology Department of Commerce
- Awarded
- to Plasma-Therm LLC
- Set-aside
- No set-aside
Opportunity facts
- Contract number
- 1333ND23PNB680350 Federal contract award
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- Place of performance
- Gaithersburg, Maryland 20899, United States
Notice details come from SAM.gov. Updated .
About this opportunity
This Award Notice from the Department of Commerce National Institute of Standards and Technology announces a non-competitive contract awarded to Plasma-Therm LLC for the purchase of one HBr-Cl-based inductively coupled plasma silicon etch system and one deep reactive ion etching-based inductively coupled plasma silicon etch system with four-year warranties, for a total estimated value of $1,411,586. The justification document approved the sole source procurement from Plasma-Therm LLC for the specialized equipment required by NIST.
Notice text
Award notice per FAR 5.301. Redacted justfication attached per FAR 6.305
Awarded contract 1333ND23PNB680350 to PLASMA-THERM LLC for 1411586.00 on 2023-08-09.
Attachments
| File | Type | Posted |
|---|---|---|
| JOFOC 23-00677_Redacted.pdf |
Notice history
| Notice | Type | Posted |
|---|---|---|
| NOTICE OF INTENT TO SOLE SOURCE: RIE05-Electrical Static Chuck Based Deep Reactive Ion Etching System | Award Notice | |
| HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System | Limited / Sole Source Justification | |
| HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System | Award Notice | |
| NOTICE OF INTENT TO SOLE SOURCE: RIE05-Electrical Static Chuck Based Deep Reactive Ion Etching System | Special Notice | |
| NOTICE OF INTENT TO SOLE SOURCE: Plasma-Therm LLC HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System | Special Notice | |
| Inductively Coupled Plasma Reactive Ion Etcher for Etching Silicon with Hydrogen Bromide and Chlorine | Pre-Solicitation |
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