Updated basic schematics for the Endstation.pdf

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CHIPS R&D Custom Diffractometry and Fourier Ptychography Endstation Federal contract opportunity
Solicitation number
1333ND26QNB030236
Issued by
Department of Commerce National Institute of Standards and Technology

About this file

This document is a contract requirements summary for a Custom Diffractometry and Fourier Ptychography Endstation with multiple optional upgrades.

The base contract (CLIN 0001) requires design and manufacture of a specialized laboratory endstation containing four primary components: a vacuum chamber, a wafer manipulation stage (WMS) with motorized 2-degree-of-freedom (DOF) control on X and Y axes, a camera manipulation stage (CMS) with motorized 4-DOF control on Z, Y, and rotational axes plus manual X-axis control, and an adjustable base. The system is designed to accommodate a NIST-supplied 300mm wafer and features specified dimensions of 40 inches wide by 28 inches deep by 24 inches high. Five optional upgrades are available: CLIN 0002 adds closed-loop feedback to the camera rotation axis (θ_cam); CLIN 0003 replaces the gravity-held metal plate with an electrostatic wafer chuck; CLIN 0004 adds Z-axis and rotational (θ) movement capability to the wafer stage while adjusting camera system height; CLIN 0005 expands the XY motion range of the wafer manipulation stage; and CLIN 0006 integrates an EUV camera into the endstation. For options CLIN 0002, 0004, 0005, and 0006, vendors must indicate the net cost increase or decrease including CAD drafting, materials, manufacture, and testing. Complete specifications for all CLINs are contained in the accompanying Statement of Work (SOW).

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Other files for this federal contract opportunity

Other files attached to CHIPS R&D Custom Diffractometry and Fourier Ptychography Endstation, newest first.
File Type Posted
1333ND26QNB030236updated.pdf PDF
NIST Questions and Answers.docx DOCX document
1333ND26QNB030236.pdf PDF
Basic schematics for the vacuum chamber.pdf PDF
Attachment 2- Applicable Provisions and Clauses.docx DOCX document
Solicitation_1333ND26QNB680229.docx DOCX document
Statement of Work.docx DOCX document

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Text version

CLIN 0001:

Custom Diffractometry and Fourier Ptychography Endstation

(summary)

1) Vacuum chamber

2) Wafer manipulation stage (WMS) metal plate to rest wafer upon (green)

Motorized stage (purple) with 2 DOF, axes : Xwaf and Ywaf

3) Camera manipulation stage (CMS) Motorized stage (blue) with 4 DOF, axes : Zcam, Ycam and cam.

with Manual stage with Xcam

4) Adjustable Base (dark red)

Full specifications in SOW NIST-supplied 300 mm wafer in Yellow.

Adjustable base

Xwaf

24”

Ycam

Ywaf

Xwaf

28”

Top-down view

Z

X y

X

Xcam

40”

Side view

Xwaf

OPTION CLIN 0002:

Camera Manipulation Stages Upgrade (CMS Upgrade)

CMS Upgrade shall be comprised of the following modification to the specifications of CLIN0001: (summary)

1) Ensure closed loop feedback on cam

Vendor shall indicate net increase or decrease in cost from this option, including CAD drafting, materials, manufacture, and testing.

Full specifications in SOW

Adjustable base

Xwaf

24”

Ycam

Ywaf

Xwaf

28”

Top-down view

Z

X y

X

Xcam

40”

Side view

Xwaf

Closed loop feedback

OPTION CLIN 0003:

Wafer Manipulation Stages Chuck upgrade (WMS Chuck)

Xcam

24”

28”

Xwaf

Top-down view

Z

X y

X

40”

Side view

Ycam

Ywaf

Xwaf y

Wafer Manipulation Stages Chuck

Upgrade shall be comprised of the following modifications to the specifications of CLIN0001: (summary)

1) Replace the metal gravity-held sample plate with an electrostatic wafer chuck (orange).

Full specifications in SOW

Adjustable base

Zwaf waf

Xwaf

24”

Xwaf

Z

X

Side view

OPTION CLIN 0004:

Wafer Manipulation Stages ZR Axes Upgrade (WMS ZR upgrade)

Xcam

28”

Top-down view

X y

40”

Ycam

Ywaf

Xwaf y

Wafer Manipulation Stages ZR Axes

Upgrade shall be comprised of the following modifications to the specifications of CLIN0001: (summary)

1) Inclusion of new axis Zwaf (red)

2) Inclusion of new axis waf (red)

3) Ensure height of camera manipulation system is adjusted (magenta).

Vendor shall indicate net increase or decrease in cost from this option, including CAD drafting, materials, manufacture, and testing.

Adjustable base

OPTION CLIN 0005:

Wafer Manipulation Stages XY Axes Upgrade (WMS XY upgrade)

Adjustable base

Xwaf

24”

Ycam

Ywaf

Xwaf

28”

Top-down view

Z

X y

X

Xcam

40”

Side view

Xwaf

Expanded Xwaf, Ywaf range

Wafer Manipulation Stages XY Axes

Upgrade shall be comprised of the following modifications to the specifications of CLIN0001: (summary)

1) Full expansion of Ywaf range (purple)

2) Limited expansion of Xwaf range (purple)

Vendor shall indicate net increase or decrease in cost from this option, including CAD drafting, materials, manufacture, and testing.

OPTION CLIN 0006:

Integrate New EUV Camera into Endstation (EUV Camera Upgrade)

Adjustable base

Xwaf

24”

Ycam

Ywaf

Xwaf

28”

Top-down view

Z

X y

X

Xcam

40”

Side view

Xwaf

Expanded Xwaf, Ywaf range

The “EUV Camera Upgrade” shall amend

CLIN 0001 to add the following: (summary)

1) EUV camera (burnt orange)

Vendor shall indicate net increase or decrease in cost from this option, including CAD drafting, materials, manufacture, and testing.

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File details come from the government source that posted it. Updated .