Molecular Beam Epitaxy (MBE) – Sputter Deposition – Angle Resolved Photoemission (ARPES) Ultra-High Vacuum Cluster Tool
Closed Solicitation Posted
This opportunity was awarded. See the award notice from .
- Solicitation number
- N00173-20-R-ZL04
- Agency
-
Office of Naval Research
Secretary of the Navy, Department of Defense
- Responses due
- Set-aside
- No set-aside
Opportunity facts
- NAICS code
- 334516 Analytical Laboratory Instrument Manufacturing
- Place of performance
- Washington, District of Columbia 20375, United States
Notice details come from SAM.gov. Updated .
About this opportunity
This combined synopsis/solicitation issued by the Department of the Navy, Secretary of the Navy Office of Naval Research seeks to procure a molecular beam epitaxy (MBE) - sputter deposition - angle resolved photoemission (ARPES) ultra-high vacuum cluster tool. The tool must include an MBE chamber, ARPES/XPS/LEED chamber, sputter deposition chamber, and sample transfer and handling module capable of vacuum requirements, sample sizes up to 3 inches, sources including Knudsen cells and electron beam evaporator, and controls for temperature, deposition rates, and collection of RHEED and ARPES data. Proposals are due by March 30, 2020 and will be evaluated based on technical approach and past performance.
There is no set-aside designated for this procurement. The solicitation involves NAICS code 334516 and PSC code 6515, with delivery required within 10 months of award and installation within 2 months thereafter at the Naval Research Laboratory in Washington D.C. Proposed pricing shall cover delivery, installation, operator and maintenance training, and a one year warranty/support period. The period of performance concludes 12 months after installation.
Notice text
This Combined Synopsis/Solicitation is for acquisition of a Molecular Beam Epitaxy (MBE) – Sputter Deposition – Angle Resolved Photoemission (ARPES) ultra-high vacuum Cluster Tool consisting of the MBE Chamber, ARPES / XPS / LEED Chamber, Sputter Deposition Chamber and Sample Transfer and Handling Module.
Please see the attached Combined Synopsis/Solicitation Document for full description of this requirement.
Files
| File | Type | Posted |
|---|---|---|
| Combined Synopsis and Solicitation_N00173-20-R-ZL04.pdf |
Notice history
| Notice | Type | Posted |
|---|---|---|
| Molecular Beam Epitaxy (MBE) – Sputter Deposition – Angle Resolved Photoemission (ARPES) Ultra-High Vacuum Cluster Tool | Award Notice | |
| This notice | Solicitation |
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