Fiji G2 Plasma ALD System

Closed Solicitation Posted

Solicitation number
4-B176-Q-00467-00
Agency
Responses due
Set-aside
No set-aside

Opportunity facts

Place of performance
Lemont, Illinois 60439, United States

Notice details come from SAM.gov. Updated .

About this opportunity

Argonne National Laboratory, under the Department of Energy Office of Science, is seeking to procure a Fiji Gen 2 Plasma ALD System with specific technical capabilities. The system must be able to deposit high-quality superconducting nitrides on 200mm wafers, have a remote plasma source, and a hot wall reactor with independent temperature control up to 300°C. The system must also meet requirements for in-situ diagnostics, minimized gas consumption, and a single precursor input. The award will be made on the basis of lowest price, technically acceptable offer. Prospective offerors must submit a completed RFQ form, pre-award information, price justification, and country of origin confirmation by the May 21, 2024 deadline.

This solicitation is not set-aside for any specific business size or type. The government has not provided any information about potential incumbents or current contractors. The solicitation does not specify an award value or budget range, but indicates that the system must meet the stated technical requirements. The place of performance is Lemont, Illinois.

Notice text

Argonne National Laboratory is seeking a Fiji Gen 2 Plasma ALD System with the following critical features: 

  • Capable of deposition on 200 mm wafers.
  • Can deposit high quality superconducting nitrides that have the following critical properties: (1) Low resistivity: (p(µOhm.cm) <= 100 for TiN and <= 200 for NbN), and (2) Superconductivity as deposited with a high transition temperature: Tc >= 3.8K for TiN and >= 13.8K for NbN. 
  • Remote plasma source with working distance of >25cm from substrate to enable ion-rich and radical rich conditions.
  • Hot wall reactor with ability to integrate in-situ diagnostics such as ellipsometry, QCM and/or residual gas analyzer(RGA)/mass spectrometer(MS). Walltemperature of the reactor must be able to be independently controlled up to 300°C.
  • System must have a single input into the chamber for precursors in order to maintain the shortest path length into the reactor; precursor inputs must be via a 3-way ALD valve, constantly purged with inert gas and manifolded into a single input point into the reactor.
  • The plasma source must not require water cooling for the automatching network. A Seren RF power supply and matching network is strongly preferred.
  • For minimized gas consumption the standard, recommended idle consumption of the system must be less than 60 sccm total gas flow of Ar/N2.

Please provide the below no later than the offer deadline: 

1. Completed and signed ANL-70 Request for Quotation (OK to include technical specifications on a separate proposal)

2. Completed and signed ANL-70B Pre-Award Information 

3. Price justification as stated in ANL-70 Request for Quotation document

4. Country of Origin confirmation

Files

File Type Posted
On-Site Work (Moderate)-01-SEP-2023.PDF PDF
Appendix A-71COM-13-FEB-2023.PDF PDF
Reps Certs ANL-70B (Long).doc DOC document
ANL-70 Request for Quotation.doc DOC document

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