Appendix B-SOW.pdf
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- Attached to
- Automatic Thin Film Mapping Tool
- Solicitation number
- 6-B187-Q-00311-00
- Issued by
-
Department of Energy Office of Science
About this file
This is a Statement of Work for RFQ No. 6-B187-Q-00311-00 issued by Argonne National Laboratory for an Automatic Thin Film Mapping Tool to be delivered to the Center for Nanoscale Materials (CNM) facility in Lemont, Illinois.
The contractor must manufacture, test, deliver, and install a thin film mapping system capable of processing substrates ranging from 5x5mm pieces to 200mm wafers, accommodating metals, semiconductors, and insulators. The system must feature wavelength range of 190-1100nm with small spot size capability (4nm-30 microns thickness range), automated turret with multiple objectives, 250-micron aperture, high-pass filter for light-sensitive samples, and comprehensive materials library supporting both patterned (die-based pattern recognition) and un-patterned samples. Acceptance criteria include software demonstrations of pattern recognition on 150mm silicon wafers, user account management, and single/multilayer recipe creation. Thin film measurement acceptance criteria require demonstration of measuring thermal 300nm SiO2 on 100mm and 150mm silicon wafers with both mapping and single measurement capabilities, plus lamp replacement demonstration. All contractor site representatives must be US citizens with acceptable identification (Real ID or Passport), comply with ANL policies and procedures, adhere to Illinois Rules of the Road, and submit a completed Job Safety Analysis using ANL form ANL-209M. The place of performance is Argonne National Laboratory, Lemont, IL 60439.
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Text version
RFQ No. 6-B187-Q-00311-00
APPENDIX B - Statement of Work
Automatic Thin Film Mapping Tool
June 12, 2026
1.0 Background
The Center for Nanoscale Materials (CNM) at Argonne National Laboratory is seeking a thin film mapping tool that will enable the CNM to characterize materials in the nanoscale.
2.0 Objective
The mapping system must be flexible enough to process a wide variety of substrates from 5x5mm piece to a 200mm wafer. All types of materials; metals, semiconductors and insulators are expected to be measured. It should have a large materials library. The tool should support patterned (pattern recognition – die based) and un-patterned samples.
Wavelength range from 190-1100nm with a small spot size (thickness range of 4nm- 30microns). It should have an automated turret with several objectives. Aperture of 250 microns. The tool should also be equipped with a high pass filter for light sensitive samples.
3.0 Scope
The contractor is to provide a thin film mapping system as described in the requirements/technical specifications (attachment 1) and meets the acceptance criteria listed below. As part of this procurement, the vendor is asked to manufacture, test, deliver, and install the measurement tool at the Center for Nanoscale Materials (CNM) facility located at Argonne National Laboratory.
4.0 Acceptance Criteria
Deliverables must comply with the Acceptance Criteria Listing document, ANL-266, dated June 9, 2025, along with the following:
(a) Software
(i) Demonstrate Pattern recognition of a 150mm Silicon wafer
(ii) Demonstrate: User account management:
(iii) Demonstrate recipe creation of single and multilayer recipes
(b) Thin Film Measurement
(i) Measure Thermal 300 nm SiO2:
(ii) 100mm Silicon wafer: with mapping and single measurement
(iii) 150mm Silicon wafer with mapping and single measurement
RFQ No. 6-B187-Q-00311-00
(c) General
(i) Demonstrate Lamp replacement
5.0 Technical Specifications and Requirements
See document titled “Attachment 1 - Technical Requirements”.
6.0 Contractor On-Site Requirements
All site visitors representing the contractor must be US citizens with acceptable forms of identification (Real ID, Passport).
The Contractor shall abide by all ANL policies and procedures in the completion of work on site.
Drivers must adhere to “Illinois Rules of the Road” while driving on site.
The Contractor shall provide a completed and signed Job Safety Analysis (JSA) using ANL form ANL-209M.
Training Requirements (as necessary depending on task)
7.0 Place of Performance
Argonne National Laboratory, Lemont, IL 60439.
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