19-0031 RFP AMND1.pdf

University of Wisconsin - Madison

AMENDMENT #1

REQUEST FOR BID

THIS IS NOT AN ORDER

AGENT: Jeff Whitman

Questions regarding this bid – see Section 3.1

For Submittal of Bid Instructions – see Section #1.

OFFICIAL SEALED

PROPOSAL NUMBER: 19-0031

ISSUE DATE: 02/26/2019

DUE DATE: 03/07/2019 2:00 PM CST

If NO BID (check here) and return.

Bid prices and terms shall be firm for sixty (60) days from the date of bid opening, unless otherwise specified in this Request for Bid by the UW-Madison Purchasing Services.

Unless otherwise noted, public openings will be on the date and time specified. Award(s), if any, will be made as soon thereafter as possible.

The bid abstract will be on file and is open to public inspection only after award determination has been made.

19-0031 / AMENDMENT #1 / ATOMIC LAYER DEPOSITION SYSTEM

Amendment #1 issued to answer questions received from bidders.

If this amendment is not returned, it shall be assumed your original bid meets all conditions of the amendment.

All other terms and conditions remain the same. Please revise and submit your bid accordingly.

In signing this bid, we have read and fully understand and agree to all terms, conditions and specifications and acknowledge that the UW-Madison Purchasing Services bid document on file shall be the controlling document for any resulting contract. We certify that we have not, either directly or indirectly, entered into any contract or participated in any collusion or otherwise taken any action in restraint of free competition; that no attempt has been made to induce any other person or firm to submit or not to submit a bid; that this bid has been independently arrived at without collusion with any other bidder, competitor or potential competitor; that this bid has not been knowingly disclosed prior to the opening of bids to any other bidder or competitor; that the stated statement is accurate under penalty of perjury. I certify that the information I have provided in this bid is true and I understand that any false, misleading or missing information may disqualify the bid.

By submitting a bid, the bidder certifies that no relationship exists between the bidder and the University that interferes with fair competition or is a Conflict of Interest, and no relationship exists between such bidder and another person or firm that constitutes a Conflict of Interest. Further, bidder certifies that no employee of the University whose duties relate to this request for bid assisted the bidder in preparing the bid in any way other than in his or her official capacity and scope of employment.

The Bidder certifies by submission of the bid that neither it nor its principals is presently debarred, suspended, proposed for debarment, declared ineligible, or voluntarily excluded from participation in this transaction by any federal department or agency.

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QUESTIONS AND ANSWERS FOR 19-0031

(ATOMIC LAYER DEPOSITION SYSTEM)

Q. 1 With respect to sections 3.9 and 4.1.19 what are the details of the acceptance tests to be demonstrated at the

University and authorized by Victor Brar? Details such as, but not limited to, films to be deposited; thickness targets; final film specification requirements; quantity of films/samples to be demonstrated; depositions modes (thermal, plasma ozone).

A 1. The vendor must demonstrate that HfO2 films grown onsite have an electrical breakdown voltage of at least 4MV/cm. Films grown onsite can be sent back for testing, or tests can be performed at the UW-Madison. We can help with testing by supplying high voltage supplies and wirebonders. The UW can also fabricate cross-bar geometries for dielectric testing. The vendor must also grow TiN films onsite that will be fabricated at the UW into microwave resonators and measured; their quality factors must reach at least 10^6. The fabrication and testing will be performed by the McDermmot group using process steps identical to those used on previously grown and tested TiN films.

Other acceptance tests are to be proposed by the bidder, and more stringent test will lead to a higher rating of the proposed system. We seek bids that contain acceptance tests that show that the system can deposit high quality films of HfO2, SiO2, TiO2, Al2O3¸ and TiN that display intrinsic material properties. For dielectrics, we prefer testing that demonstrates a dielectric breakdown voltage near intrinsic values for wirebonded samples. For superconductors, we prefer testing that demonstrates low loss at microwave frequencies through resonator fabrication, and tests that demonstrate intrinsic Tc’s.

Q. 2 With respect to section 4.1.2 are there any film specification requirements for the ‘pre-optimized’ recipes to achieve? E.g. refractive index or Growth Per Cycle.

A 2. Pre-optimized recipes for dielectrics must contain deposition parameters that guarantee growth of films with intrinsic refractive indices and electric field breakdown values.

Q. 3 With respect to section 4.1.5 how will uniformity be calculated? Is the requirement for all films or a specific film?

A 3. Film thickness uniformity can be measured at the UW using an in-house ellipsometer (Wollam V-Vase), or the bidder can use their own film thickness monitors (mailing back samples is okay). Proposers who are willing to perform these tests on more materials will be rated higher.

Q. 4 With respect to section 4.1.8 what is the base or operating pressure requirement for the load lock? Is a specific type of pump requested, e.g. turbo pump.

A 4. Lower LL base pressures are preferred. A LL that is evacuated with a turbo pump is preferred.

Q. 5 With respect to section 4.1.10 how is the TiN film with an intrinsic quality factor of in excess of 10^6 at microwave frequencies to be demonstrated/measured? If the vendor cannot measure the intrinsic quality factor will the University? With respect to section 4.1.11 how is the NbN film with a superconducting transition temperature of >12 k to be demonstrated/measured? If the vendor cannot measure the superconducting transition temperature will the University?

A 5. For TiN, see above under acceptance testing. For NbN, the resistance of the films should be measured as a function of temperature. If the vendor cannot perform those tests, they can be performed by groups at the

UW.

QUESTIONS AND ANSWERS FOR 19-0031

(ATOMIC LAYER DEPOSITION SYSTEM)

Q. 6 With respect to section 4.1.12 how is the VO2 film that exhibits thermochromic, metal to insulator transition near 68°C to be demonstrated/measured? If the vendor cannot measure the metal to insulator transition temperature will the University.

A 6. The vendor should provide optical data showing a characteristic change in reflectance or absorption of a VO2 film grown on their system or on an identical system. Optical measurements can be performed onsite using an FTIR w/ a temperature controlled stage.

Q. 7 With respect to section 4.1.16; what is required to demonstrate the repeatability of system performance? What films or type of films (e.g. oxides) are required to run in back-to-back depositions? Is this test part of the acceptance tests?

A 7. The vendor must demonstrate that film quality does not change from run to run, and that the film quality is not effected by the material that was grown before. The vendor can show results from identical systems that demonstrate repeatability in their proposal, or these demonstrations can be performed on site as an acceptance test. Measurements of Tc, wavelength dependent refractive index, or breakdown voltage are acceptable metrics. More rigorous demonstrations (more material combinations, more runs, etc…) will be scored higher.

Q. 8 With respect to section 3.4; will the University provide all necessary utilities, as required by the vendor, for the tool to connect to? E.g. electrical, water, gas.

A 8. The University will provide utilities that are standard for a research cleanroom.