19-0031 RFP AMD 2.docx

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ATOMIC LAYER DEPOSITION SYSTEM (UW-MAD) [19-0031]
Solicitation number
19-0031
Issued by
Dane County, Madison City, Wisconsin

About this file

This is Amendment #2 to Request for Proposal 19-0031 issued by the University of Wisconsin - Madison Purchasing Services for an Atomic Layer Deposition (ALD) System. The amendment was issued on February 27, 2019, to further clarify answers to questions submitted by bidders in response to Amendment #1. The proposal due date is March 7, 2019, at 2:00 PM CST. The amendment addresses eight key clarifications regarding acceptance testing requirements, film specifications, uniformity calculations, load lock pressure requirements, superconductor and optical material performance demonstrations, system repeatability, and utility provisions. Bidders are encouraged to propose rigorous acceptance tests that demonstrate the system's capability to deposit high-quality films of materials including HfO2, SiO2, TiO2, Al2O3, NbN, and TiN, with specifications tailored to dielectric, superconductor, and optical applications. More stringent and comprehensive testing proposals will receive higher ratings during evaluation.

Proposal prices and terms are firm for sixty days from the proposal date to opening unless otherwise specified. The amendment clarifies that pre-optimized recipes for dielectric films must guarantee intrinsic refractive indices and electric field breakdown values, and that film thickness uniformity can be measured either at UW using in-house equipment or by the bidder using their own monitors. For acceptance testing of advanced materials, vendors must either provide published documentation demonstrating performance on identical systems or conduct demonstrations on-site at the University. The University will provide standard utilities typical for research cleanroom facilities. All other terms and conditions from the original RFP remain unchanged, and bidders are required to return the amendment with their revised bids or their original bids will be assumed to meet all amendment conditions.

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Proposal No. 19-0031

UNIVERSITY OF WISCONSIN

MADISON, WISCONSIN 53715-1218

University of Wisconsin – Madison

AMENDMENT #2

Request For Proposal

THIS IS NOT AN ORDER

OFFICIAL SEALED

Proposal Number: 19-0031

NO PUBLIC OPENING

AMD #2 Issue Date: 2/27/2019

Due Date: 03/07/2019 2:00 PM CST Agent: JEFF WHITMAN

Questions regarding this proposal – see Section 2.8

For Submittal Instructions & Proposal Response Format – see Section 2.2 and 2.3

Proposal prices and terms shall be firm for sixty (60) days from the date of the proposal to the opening, unless otherwise specified in this Request for Proposal by the UW-Madison Purchasing Services.

If NO BID (check here) ☐ and return.

ATOMIC LAYER DEPOSITION SYSTEM

Amendment #2 issued to further clarify the answers to questions from Amendment #1.

If this amendment is not returned, it shall be assumed your original bid meets all conditions of the amendment.

All other terms and conditions remain the same. Please revise and submit your bid accordingly.

In signing this bid, we have read and fully understand and agree to all terms, conditions and specifications and acknowledge that the UW-Madison Purchasing Services bid document on file shall be the controlling document for any resulting contract. We certify that we have not, either directly or indirectly, entered into any contract or participated in any collusion or otherwise taken any action in restraint of free competition; that no attempt has been made to induce any other person or firm to submit or not to submit a bid; that this bid has been independently arrived at without collusion with any other bidder, competitor or potential competitor; that this bid has not been knowingly disclosed prior to the opening of bids to any other bidder or competitor; that the stated statement is accurate under penalty of perjury. I certify that the information I have provided in this bid is true and I understand that any false, misleading or missing information may disqualify the bid.

By submitting a bid, the bidder certifies that no relationship exists between the bidder and the University that interferes with fair competition or is a Conflict of Interest, and no relationship exists between such bidder and another person or firm that constitutes a Conflict of Interest. Further, bidder certifies that no employee of the University whose duties relate to this request for bid assisted the bidder in preparing the bid in any way other than in his or her official capacity and scope of employment.

The Bidder certifies by submission of the bid that neither it nor its principals is presently debarred, suspended, proposed for debarment, declared ineligible, or voluntarily excluded from participation in this transaction by any federal department or agency.

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Further Clarification of Answers to Questions from Bidders

UW RFP #19-0031

1) With respect to sections 3.9 and 4.1.19 what are the details of the acceptance tests to be demonstrated at the University and authorized by Victor Brar? Details such as, but not limited to, films to be deposited; thickness targets; final film specification requirements; quantity of films/samples to be demonstrated; depositions modes (thermal, plasma ozone).

Acceptance tests are to be proposed by the bidder, and more stringent tests will lead to a higher rating of the proposed system. The vendor is encouraged to include acceptance tests related to chamber pressure, temperature control of sources, flow rates, plasma powers, deposition rates, and any other parameters that may effect ALD film growth. We also seek bids that contain acceptance tests that show that the system can deposit high quality films of HfO2, SiO2, TiO2, Al2O3¸ NbN and TiN that display intrinsic material properties. For dielectrics, we prefer testing that demonstrates a dielectric breakdown voltage near intrinsic values for wirebonded samples. For superconductors, we prefer testing that demonstrates low loss at microwave frequencies through resonator fabrication, and tests that demonstrate intrinsic Tc’s. For optical materials, we prefer testing that demonstrates intrinsic optical properties. Testing can be performed onsite with the assistance of UW research groups (for measuring optical properties, breakdown voltages, superconductor Tc, and superconductor resonantor Q factors), or testing can be done by the bidder by mailing samples back to test facilities. The vendor may also point to publications that utilize ALD films grown on identical systems, and perform measurements that indicate the equivalence of films grown at the UW and those grown on other systems.

2) With respect to section 4.1.2 are there any film specification requirements for the ‘pre-optimized’ recipes to achieve? E.g. refractive index or Growth Per Cycle.

Pre-optimized recipes for dielectrics must contain deposition parameters that guarantee growth of films with intrinsic refractive indices and electric field breakdown values.

3) With respect to section 4.1.5 how will uniformity be calculated? Is the requirement for all films or a specific film?

Film thickness uniformity can be measured at the UW using an in-house ellipsometer (Wollam V-Vase), or the bidder can use their own film thickness monitors (mailing back samples is okay). Proposers who are willing to perform these tests on more materials will be rated higher. Alternatively, in their bid, the vendor may include data from equivalent and characteristic systems to show that their systems routinely demonstrate the uniformity specs in the RFP.

4) With respect to section 4.1.8 what is the base or operating pressure requirement for the load lock? Is a specific type of pump requested, e.g. turbo pump.

Lower LL base pressures are preferred. A LL that is evacuated with a turbo pump is preferred.

5) With respect to section 4.1.10 how is the TiN film with an intrinsic quality factor of in excess of 10^6 at microwave frequencies to be demonstrated/measured? If the vendor cannot measure the intrinsic quality factor will the University? With respect to section 4.1.11 how is the NbN film with a superconducting transition temperature of >12 k to be demonstrated/measured? If the vendor cannot measure the superconducting transition temperature will the University?

For both TiN and NbN, the vendor must be able to point to published documentation or test results on similar ALD tools that show their system can grow those materials with the listed specifications. If the vendor cannot point to such documentation, demonstrations can be performed onsite as an acceptance test. For NbN, the resistance of the films should be measured as a function of temperature. If the vendor cannot perform those tests, they can be performed by groups at the UW. For TiN films, groups at the UW can assist in fabricating films into microwave resonators and testing them using process steps identical to those used on previously grown and tested TiN films.

6) With respect to section 4.1.12 how is the VO2 film that exhibits thermochromic, metal to insulator transition near 68°C to be demonstrated/measured? If the vendor cannot measure the metal to insulator transition temperature will the University.

The vendor should provide optical data or point to published documentation showing a characteristic change in reflectance or absorption of a VO2 film grown on their system or on an identical system. If the vendor cannot point to such documentation, optical measurements can be performed onsite as an acceptance test using an FTIR w/ a temperature controlled stage.

7) With respect to section 4.1.16; what is required to demonstrate the repeatability of system performance? What films or type of films (e.g. oxides) are required to run in back-to-back depositions? Is this test part of the acceptance tests?

The vendor must demonstrate that film quality does not change from run to run, and that the film quality is not effected by the material that was grown before. The vendor can show results from identical systems that demonstrate repeatability in their proposal, or these demonstrations can be performed on site as an acceptance test. Measurements of Tc, wavelength dependent refractive index, or breakdown voltage are acceptable metrics. More rigorous demonstrations (more material combinations, more runs, etc…) will be scored higher.

8) With respect to section 3.4; will the University provide all necessary utilities, as required by the vendor, for the tool to connect to? E.g. electrical, water, gas.

The University will provide utilities that are standard for a research cleanroom.

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