Purchase of an Ion Beam Etch and Ion Beam Deposition System
Closed Solicitation Posted
This opportunity was awarded. See the award notice from .
- Solicitation number
- 1333ND23QNB680459
- Agency
-
National Institute of Standards and Technology
Department of Commerce
- Responses due
- Set-aside
- No set-aside
Opportunity facts
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- PSC
- 6640 Laboratory Equipment And Supplies
- Place of performance
- Boulder, Colorado 80305, United States
Notice details come from SAM.gov. Updated .
About this opportunity
The National Institute of Standards and Technology seeks to procure one ion beam etch and ion beam deposition system through request for quotation number 1333ND23QNB680459, with quotations due by August 10, 2023. Technical capability is the most important evaluation criteria, followed by past performance, and price is the least important. The solicitation also allows for optional spare parts kits, load lock pumps, and chamber roughing pumps.
There is no set-aside designation for this procurement. The NAICS code is 333242 and the procurement is set as full and open competition. The place of performance is the NIST Boulder Microfabrication Facility in Boulder, Colorado. The system must be able to etch and deposit materials on substrates up to 150mm wafers and meet technical specifications for base pressure, process gas control, endpoint detection, and etch and deposition uniformity outlined in the statement of work. Delivery, installation, training and a one-year warranty are required to be provided by the selected vendor and placed at NIST Boulder.
Notice text
Please see Attachments for full details.
Files
Notice history
| Notice | Type | Posted |
|---|---|---|
| Purchase of an Ion Beam Etch and Ion Beam Deposition System | Award Notice | |
| This notice | Solicitation | |
| Ion Beam Etch and Ion Beam Deposition system | Pre-Solicitation |
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