Inductively Coupled Plasma Deep Reactive Ion Etch
Award Notice Posted
- Solicitation number
- N0017325P0063
- Agency
-
Office of Naval Research
Secretary of the Navy, Department of Defense
- Awarded
- to Oxford Instruments America, Inc.
- Set-aside
- No set-aside
Opportunity facts
- Contract number
- N0017325P0063 Federal contract award
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- Place of performance
- United States
- Points of contact
Notice details come from SAM.gov. Updated .
About this opportunity
The Office of Naval Research, part of the Department of the Navy, awarded a non-competitive, firm-fixed price contract N0017325P0063 to Oxford Instruments America, Inc. for an Inductively Coupled Plasma Deep Reactive Ion Etch system on September 25, 2025. The contract value totals $687,895.85 and represents specialized semiconductor manufacturing equipment used for precision etching processes in advanced materials research and development. This award notice was posted on September 26, 2025, and utilized no set-aside provisions, indicating it was procured through sole-source acquisition methods typical for highly specialized scientific instrumentation.
Notice text
The awarded contract is a non-competitive, firm-fixed price award to the awardee specified.
Awarded contract N0017325P0063 to OXFORD INSTRUMENTS AMERICA, INC. for 687895.85 on 2025-09-25.
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