Attachment 1 - Salient Characteristics.pdf
PDF 104 KB Posted
- Attached to
- USAFA Thin Film Vacuum Deposition and Coating System Federal contract opportunity
- Solicitation number
- FA700025Q0044
About this file
This document lists the salient characteristics for a sophisticated deposition chamber system. The specifications include a stainless steel chamber measuring at least 19 x 19 x 36 inches with welded side plates and a load lock system. The system features multiple deposition sources, including two 2-inch magnetron ion sputter sources, a 4-pocket E-beam source, and two thermal evaporation sources, along with comprehensive power supply and pumping capabilities.
Key technical features include a 1500 L/s cryopump, dry scroll mechanical pump, four thickness control crystal sensors, and a computer-controlled interface. The system supports substrate processing with a minimum substrate size of 4 inches and heating capabilities up to 350 °C. Additional specifications include two process gas channels with mass flow controllers, DC and RF power supplies, and comprehensive shipping and freight included in the price. The detailed list suggests this is a high-end scientific or industrial deposition equipment specification.
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Other files for this federal contract opportunity
| File | Type | Posted |
|---|---|---|
| Combined Synopsis Solicitation_Coating System_FA700025Q0044 Amendment 3.pdf | ||
| Attachment 4 - FAR 52.212-3(b).pdf | ||
| Tech Clarifiaction Answers.pdf | ||
| Tech Clarifiaction Answers.pdf | ||
| Attachment 2 - Provisions and Clauses_FA700025Q0044.pdf | ||
| Attachment 3 - Buy American Certificate.pdf | ||
| Combined Synopsis Solicitation_Coating System_FA700025Q0044.pdf |
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Text version
Salient Characteristics
• Stainless steel deposition chamber of size at least 19 x 19 x 36 inches (depth x width x height).
• Welded side plates of main chamber.
• Load Lock system.
• Two magnetron ion sputter sources of size 2 inch.
• 4-pocket E-beam source.
• Two thermal evaporation sources.
• Dry scroll mechanical pump.
• 1500 L/s or better cryopump.
• Four thickness control crystal sensors.
• DC and RF power supplies for ion sputter sources.
• Two DC power supplies for thermal evaporation sources.
• Minimum substrate size at least 4 inches.
• Substrate heating to at least 350 °C.
• Two process gas channels with mass flow controller
• Computer controlled interface
• Shipping and freight included in price.
File details come from the government source that posted it. Updated .