Q and As 4.pdf
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- Attached to
- High Uniformity Sputter Deposition System Federal contract opportunity
- Solicitation number
- 80GSFC20Q0004
About this file
This document summarizes a solicitation for a high uniformity sputter deposition system. NASA Goddard Space Flight Center requires a system for sputter depositing thin metal films with stringent requirements for thickness uniformity, purity, electrical quality, and cleanliness. The system must maintain performance over many years with good throughput and minimal downtime. Offers are due no later than March 11, 2020. Technical capability, past performance, and price will be evaluated, with technical capability and past performance significantly more important than price. Offerors must demonstrate how specifications for thickness uniformity and vacuum pressure will be achieved and provide evidence of particulate contamination prevention.
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Other files for this federal contract opportunity
| File | Type | Posted |
|---|---|---|
| Q&As 3.pdf | ||
| Updated SOW High Uniformity Sputter Deposition Tool.pdf | ||
| Q&As 2.pdf | ||
| Q&As.pdf | ||
| SOW High Uniformity Sputter Deposition Tool.pdf |
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Text version
QUESTION 29: Two magnetron power supplies are requested. Do the users intend to run two of them at the same time (i.e. co-deposition?) This is not common with linear magnetrons. Please clarify what the two power supplies are for.
ANSWER 29: NASA GSFC may produce multilayer films. In one example, Al/AlMn multilayers, the targets are on at the same time and the wafer is rotated over each target successively. If only one power supply needs to be used. Then the other will serve as a backup.
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