Attachment_V_-_Req_for_Water.pdf

REQUIREMENTS FOR WATER AT THE POINT OF DISTRIBUTION IN THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES

ASTM D5127-13

Parameter Type E-1 Type E-1.1 Type E-1.2B Type E-1.3B Type E-2 Type E-3 Type E-4

Linewidth (microns) 1.0–0.5 0.35–0.25 0.18–0.09 0.065–0.032 5.0–1.0 >5.0 —

Resistivity, 25°C (On-line) 18.1 18.2 18.2 18.2 16.5 12 0.5

TOC (μg/L) (on-line for <10 ppb) 5 2 1 1 50 300 1000

On-line dissolved oxygen (μg/L) 25 10 3 10 — — —

On-Line Residue after evaporation (μg/L) 1 0.5 0.1 — — —

On-line particles/L (micron range)

>0.05 μm 500

0.05–0.1 1000 200 N/A — — —

0.1–0.2 1000 350 <100 N/A — — —

0.2–0.5 500 <100 <10 N/A — — —

0.5-1.0 200 <50 <5 N/A — — —

1.0 <100 <20 <1 N/A — — —

SEM particles/L (micron range)

0.1–0.2 1000 700 <250 N/A — — —

0.2–0.5 500 400 <100 N/A 3000 — —

0.5–1 100 50 <30 N/A — 10 000 —

10 <50 <30 <10 N/A — — 100 000

Bacteria in CFU/Volume

100 mL Sample 5 3 1 N/A 10 50 100

1 L Sample 10 1 http://www.astm.org/Standards/D5127.htm#tfn00003 http://www.astm.org/Standards/D5127.htm#tfn00003

10 L Sample 1

Silica – total (μg/L) 5 3 1 0.5 10 50 1000

Silica – dissolved (μg/L) 3 1 0.5 0.5 — — —

Anions and Ammonium by IC (μg/L)

Ammonium 0.1 0.10 0.05 0.050 — — —

Bromide 0.1 0.05 0.02 0.050 — — —

Chloride 0.1 0.05 0.02 0.050 1 10 1000

Fluoride 0.1 0.05 0.03 0.050 — — —

Nitrate 0.1 0.05 0.02 0.050 1 5 500

Nitrite 0.1 0.05 0.02 0.050 — — —

Phosphate 0.1 0.05 0.02 0.050 1 5 500

Sulfate 0.1 0.05 0.02 0.050 1 5 500

Metals by ICP/MS (μg/L)

Aluminum 0.05 0.02 0.005 0.001 — — —

Antimony 0.001

Arsenic 0.001

Barium 0.05 0.02 0.001 0.001 — — —

BoronC 0.3 0.1 0.05 0.050 — — —

Cadmium 0.010

Calcium 0.05 0.02 0.002 0.001 — — —

Chromium 0.05 0.02 0.002 0.001 — — —

Copper 0.05 0.02 0.002 0.001 1 2 500

Iron 0.05 0.02 0.002 0.001 — — — http://www.astm.org/Standards/D5127.htm#tfn00002

Lead 0.05 0.02 0.005 0.001 — — —

Lithium 0.05 0.02 0.003 0.001 — — —

Magnesium 0.05 0.02 0.002 0.001 — — —

Manganese 0.05 0.02 0.002 0.010 — — —

Nickel 0.05 0.02 0.002 0.001 1 2 500

Potassium 0.05 0.02 0.005 0.001 2 5 500

Sodium 0.05 0.02 0.005 0.001 1 5 1000

Strontium 0.05 0.02 0.001 — — —

Tin 0.010

Titanium 0.010

Vanadium 0.010

Zinc 0.05 0.02 0.002 0.001 1 5 500

Temperature Stability (K) ±1

Temperature Gradient (K/10 min) <0.1

Dissolved Nitrogen On-line (mg/L) 8-18

Dissolved Nitrogen Stability (mg/L) ±2

A. The user should be advised that analytical data often are instrument dependent and technique dependent. Thus, the numbers in Table 1 are only guidelines. This table will be revised whenever the semiconductor industry develops new linewidths, thereby keeping the guidelines current.

B. Values shown in Type E-1.3 are a result of aligning ITRS risk factors of known contaminates to the production processes found in current semiconductor processing for the linewidth of interest and may differ in a few cases to those found in Type E-1.2. Users who wish to use the higher numbers for Type

E-1.2 water should feel free to do so.

C. All values are equal to or less than with the exception of Resistivity.

D. Boron is monitored only as an operational parameter for monitoring the ion-exchange beds.

1. Scope

1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 micron. In all cases, the recommendations are for water at the point of distribution (POD).

1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.

http://www.astm.org/Standards/D5127.htm#t00001

1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D1193 and Guide D5196.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

2. Referenced Documents. The documents listed below are referenced within the subject standard but are not provided as part of the standard.

D1129 Terminology Relating to Water

D1193 Specification for Reagent Water

D1976 Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy

D2791 Test Method for On-line Determination of Sodium in Water

D3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption Spectrophotometry

D4191 Test Method for Sodium in Water by Atomic Absorption Spectrophotometry

D4192 Test Method for Potassium in Water by Atomic Absorption Spectrophotometry

D4327 Test Method for Anions in Water by Suppressed Ion Chromatography

D4453 Practice for Handling of High Purity Water Samples

D4517 Test Method for Low-Level Total Silica in High-Purity Water by Flameless Atomic Absorption Spectroscopy

D5173 Test Method for On-Line Monitoring of Carbon Compounds in Water by Chemical Oxidation, by UV Light Oxidation, by Both, or by High Temperature

Combustion Followed by Gas Phase NDIR or by Electrolytic Conductivity

D5196 Guide for Bio-Applications Grade Water

D5391 Test Method for Electrical Conductivity and Resistivity of a Flowing High Purity Water Sample

D5462 Test Method for On-Line Measurement of Low-Level Dissolved Oxygen in Water

D5542 Test Methods for Trace Anions in High Purity Water by Ion Chromatography

D5544 Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water

D5673 Test Method for Elements in Water by Inductively Coupled Plasma--Mass Spectrometry

D5996 Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography

D5997 Test Method for On-Line Monitoring of Total Carbon, Inorganic Carbon in Water by Ultraviolet, Persulfate Oxidation, and Membrane Conductivity Detection

F1094 Test Methods for Microbiological Monitoring of Water Used for Processing Electron and Microelectronic Devices by Direct Pressure Tap Sampling Valve and by the Presterilized Plastic Bag Method http://www.astm.org/Standards/D1193.htm http://www.astm.org/Standards/D5196.htm