RIE plasma etch system

This solicitation is being posted to both the Federal Business Opportunities(FBO) page located at http://www.fbo.gov/ and the Navy Electronic Commerce on Line(NECO) site located at https://www.neco.navy.mil/ While it is understood that FBO is the single point of entry for posting of synopsis and solicitations to the internet, NECO is the alternative in case FBO is unavailable. Please feel free to use either site to access information posted by NSWC Crane.



This solicitation being issued pursuant to the procedures at FAR 13. Synopsis exception FAR 5.202(a)(13) applies and RFQ Number N00164-12-T-0169 is hereby issued as an attachment hereto.



This solicitation is Competitive and SET-ASIDE 100 percent FOR SMALL BUSINESS.

The government contemplates award of a Firm Fixed Price (FFP) resulting from this solicitation for a RIE Plasma Etch System with pump and chiller IAW the following requirements:



1.0 This specification is for the procurement of a Reactive Ion Etch (RIE) Plasma Etch System of which will be utilized in the removal of silicon nitride passivation layer(s) found on electronic components. In addition to the following technical requirements, this procurement action is for said equipment, as described herein.



2.0 Technical Specifications of RIE Plasma Etch System, which will include a pump and chiller as follows:

a. Must have an automatic tuning 600W RF Generator

b. Must be RIE (Reactive Ion Etch)

c.

Must have rotary vane pump with oil filtration, demister, and prepared for oxygen.

d. Must have a minimum 6 inch bottom electrode.

e. Chamber construction must be compatible with oxygen, SF6, Fluorocarbon Process Gasses

f. At a minimum of 2 mass air controllers

g. Recirculating temperature controller that does not require water.

h. Must have 220V, 15 Amp, 1 phase, 3 wire, 50/60Hz



3.0 Warranty. The RIE Plasma Etch System will come with the following Warranties: 12 month - All parts and labor costs



CLIN 0001: 1 each, RIE Plasma Etch System

CLIN 0002: 1 each, Vacuum Pump for RIE Plasma Etch System

CLIN 0003: 1 each, Air Cooled Chiller for RIE Plasma Etch System



Required Delivery: FOB Destination to NSWC Crane Div, 300 HWY 361, Crane, IN 47522-5001; 6 Weeks ARO.

Evaluation of Quotes: Lowest Price Technically Acceptable

Acceptable Quotes shall consist of completing the solicitation in full, and providing technical data product literature for government review to determine that all requirements are met.



Quotes that are non-compliant with any material requirement of this solicitation may be rejected without further consideration for award.

Contractors must be properly registered in the Government's Central Contractor Registration (CCR).

Offerors may obtain information on CCR registration and annual confirmation requirements by calling 1-866-606-8220, or via the internet at https://www.bpn.gov/ccr/contractors.aspx

All changes to the requirement that occur prior to the closing date will be posted to FedBizOpps and NECO. It is the responsibility of interested vendors to monitor FedBizOpps and/or NECO for amendments that may be issued to this solicitation. For changes made after the closing date, only those offerors that provide a proposal will be provided any changes/amendments and considered for future discussions and/or award. Offers may be faxed to Sharon LaPray-Mitchell, FAX 812-854-3471 or e-mailed to sharon.lapray@navy.mil.

All required information must be received on or before 3:00 p.m. EDT (local time).