Photolithography Exposure System
Award Notice Posted
- Solicitation number
- HT942525PE042
- Agency
-
Defense Health Agency
Department of Defense
- Awarded
- to Heidelberg Instruments Inc.
- Set-aside
- Total Small Business
Opportunity facts
- Contract number
- HT942525PE042 Federal contract award
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- Place of performance
- Gunpowder, Maryland 21010, United States
Notice details come from SAM.gov. Updated .
About this opportunity
The Defense Health Agency awarded a federal contract valued at $160,700 to Heidelberg Instruments Inc. on September 18, 2025, for the procurement of a photolithography exposure system for the U.S. Army Medical Research Institute of Chemical Defense (USAMICD). The contract covers a specialized UV light system designed for prototyping electrode designs, capable of operating with either a mask aligner or direct laser writer configuration with 365nm UV wavelength compatibility for SU-8 photoresist applications. The system must deliver precise pattern alignment with resolution capabilities of 2 microns or less, accommodate standard 6-inch wafer exposure areas, and support both soft and hard contact exposure modes while operating outside of clean room environments. This procurement represents a total small business set-aside opportunity focused on supporting advanced research capabilities for chemical defense applications.
Notice text
The U.S. Army Medical Research Institute of Chemical Defense (USAMICD) requires a photolithography exposure system which could be a mask aligner or a direct laser writer (also known as a “maskless” aligner). It shall have a UV light source that passes light through an inserted photomask onto a substrate coated in photoresist. The system shall be able to align this projected pattern precisely with the substrate being exposed. The UV light wavelength shall be compatible with SU-8 photoresist (365nm). Operating parameters shall be digitally controlled with a programmable logic controller system or included computer. Created patterns shall be repeatable with a resolution of 2 microns or less. The system shall be able to expose an area up to and including that of a standard 6” wafer. It shall be capable of both soft and hard contact exposure. The system will be used for prototyping electrode designs with precise features. It should not require a clean room to operate.
Awarded contract HT942525PE042 to HEIDELBERG INSTRUMENTS INC. for 160700.00 on 2025-09-18.
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