one (1) cluster deposition system with double radial distribution chamber (RDC) configuration and one (1) X-Ray Photoelectron Spectroscopy (XPS) characterization system

Sources Sought Template:

(1) Action Code :     SOURCES SOUGHT

This is a Sources Sought Notice only. This is not a request for proposal, but a survey to locate potential sources.  This Sources Sought does not constitute an Invitation for Bids, Request for Proposals, or a Request for Quotations, and is not to be construed as a commitment by the Government to issue an order or otherwise pay for the information solicited, nor is it a guarantee of a forthcoming solicitation or contract. It is for market research purposes only. Respondents will not be notified of the results of the evaluation.

The purpose of this Sources Sought Notice is to gain knowledge of interest, capabilities, and qualifications of various members of industry, to include the Small Business Community: Small Business, Section 8(a), Historically Underutilized Business Zones (HUB-Zone), Service-Disabled Veteran-Owned Small Business (SDVOSB), Women-Owned Small Business (WOSB), and Economically Disadvantaged Women-Owned Small Business (EDWOSB). The Government must ensure there is adequate competition among the potential pool of responsible contractors. Small business, Section 8(a), HUBZone, SDVOSB, WOSB, & EDWOSB businesses are highly encouraged to participate.

(2) Date : 07/07/2021                  

(3) Classification Code : 66         

(4) NAICS Code : 334516

(5) NAICS Size Standard: 1000 employees

(6) Contracting Office Address: 2800 Powder Mill Road
       Bldg. 601
       Adelphi, Maryland 20783

(7) Subject:  Sources Sought for one (1) cluster deposition system with double radial distribution chamber (RDC) configuration and one (1) X-Ray Photoelectron Spectroscopy (XPS) characterization system

(8) Proposed Solicitation Number:  W911QX21Q0175

(9) Sources Sought Closing Response Date: 14 July 2021

(10) Contact Point: Contract Specialist, 301-394-5332, crystal.l.demby.civ@mail.mil  

(11) Contract Line Item Number (CLIN) 0001: The Contractor shall deliver to Adelphi, MD one (1) cluster deposition system with double radial distribution chamber (RDC) configuration and one (1) X-Ray Photoelectron Spectroscopy (XPS) characterization system meeting the following minimum requirements:

1. Double Radial Distribution Chamber (RDC) minimum requirements:

• Radial Distribution Chamber for 4" Plates, shall include:
  • Ellipsoidal transfer chamber
  • Radial telescopic transfer arm with two motorized axes (extension and polar angle) with transfer fork for 4" sample plates
  • Turbo-molecular pump (nominal pumping speed 685 liters per second(l/s)and an oil-free scroll backing pump (nominal pumping speed 6.2 m³/hr [cubic meters per hour])  with automatic shutoff valve nominal size/type DN  25 Quick Flange (KF)  pumping lines and KF connectors
  • Wide-range pressure gauge 1 atmosphere (atm)] to 1 x 10-8 millibar (mbar)  with pressure readout and display via control system
  • Bakeout cover - control system for safe and convenient handling of the system at all times, pumps and pressure gauges should be integrated, valves, and the radial transfer arm. - Semi-automated sample transfer, controlled via tablet/computer.

• Shall include a maximum 4 inch wafer compatibility loader and design for modular and configuration and addition of third party tools.

• Mechanical integration to atomic layer deposition(ALD)  shall include the following characteristics:
  • Size/type DN 160 conflat flange (CF) Transfer tube, where DN 160 CF refers to 8.00" outer diameter (OD) Type 304L stainless steel (SS) Standard ConFlat® (CF) Flanges.
  • Flexible bellows with springs for adjustment,
  • Pneumatic gate valve type/size DN 160 CF with position indicator to prevent collisions between gate valve and transfer arm.
  • Sample plates for load/transfer.
  • Provide flag style wafer holder options.
  • Meet a pass line height for the transfer module (height of integration) 1200 millimeters(mm)
  • Radial Distribution Chamber (RDC) telescopic reach to achieve a 1074 mm radius from center.

• Shall include a Wafer flipper

• Shall include a Wafer storage carousel for up to four 4" wafers
  • mounted on a rotary feedthrough and a linear shift with position encoder –
  • Quick access door DN 160 CF with integrated viewport –
  • Load lock chamber for 4" sample holders for connection to a Radial Distribution Chamber: - UHV chamber made of stainless steel with ports for a quick access door, The load lock chamber is electrically integrated to the control system of the host module (e.g. Radial Distribution Chamber)
  • pressure measurement,
  • an optional lamp heater,
  • a DN 160 CF port for connection to an adjacent ultra-high vacuum(UHV) chamber, e.g. a Radial Distribution Chamber

• Shall include a Turbo-molecular pump (nominal pumping speed 270 l/s)

• Shall include an Oil-free scroll backing pump (nominal pumping speed 6.3 m³/hr.) with automatic shutoff valve DN 25 KF, pumping lines and KF connectors

• Shall include a Wide-range pressure gauge (atm...1 x 10-8 mbar) with pressure readout and display via an existing control system

• Shall include a Wafer heater and storage loadlock off of one RDC: A wafer holder with storage and processing capabilities for high temperature annealing designed on the RDC components on the HV side (close to the ALD). The heating capabilities up to 650 (degrees Celsius) and adequate heating rates as needed.

• Shall include a Set of 4" Sample Plates Consisting of:
  • Transfer tube,
  • Flexible bellows with springs for adjustment,
  • Pneumatic gate valve with position indicator to prevent collisions between gate valve and transfer arm.

1. XPS Lab Module minimum requirements:

• Shall include a Spherical analysis chamber made of mu-metal with the following characteristics.
  • Prepared for electron energy analyzers and X-ray sources in magic angle geometry.
  • Optimized ports for additional options like Auger Electron Spectroscopy (AES), Vacuum Ultraviolet (VUV), depth profiling, gas cluster ion beam sputtering, and charge neutralization.
  • Equipped with additional ports for upgrade options, blank flanges, and viewports covered with lead glass.
  • UHV system, designed for X-ray Photoelectron Spectroscopy (XPS) with X-ray, VUV photoelectron spectroscopy, and Auger electron spectroscopy. Turbomolecular Pump 300 and titanium sublimation pump (TSP) - Standard pump configuration for analysis chamber - 260 l/s turbomolecular pump backed by 6 m³/hr. scroll pump and TSP.
  • Ion getter pump (option availability)
  • Electromagnetic KF shutoff valve to isolate the roughing pump from the vacuum chamber and turbo pump, e.g., in case of a power failure.
  • Pressure measurement by UHV ion gauge (BA type).
  • Base pressure for analysis chamber better than 5 x 10-10 mbar. Base pressure for analysis chamber with optional ion-getter-pump better than 3 x 10-10 mbar

• Shall include an Excitation sources with Small spot size of <150 micrometers (μm) diameter (at 50 mm working distance), Raster area of 10 mm x 10 mm (at 50 mm working distance) with the following characteristics:
  • Monochromated Al-Ka X-ray with an excitation line width is < 250 meV. High power X-ray mode for continuous operation at 300 Watts. The system shall include a closed-circuit water cooling system for the anode.
  • VUV,
  • focused ion sources.

• Shall include a Detector (high dynamic range from single electron detection up to >100 MHz with linear response) with the following characteristics:
  • Minimum of 128 detection channels.
  • Count rate Resolution 0.6-1.2 eV FWHM (Full width at half maximum) for 0.75-3.0  Megacountsper second (Mcps))
  • Snapshot mode capability
    • continuous operation
    • millisecond (ms) dwell time
    • Window: 14.5% of pass energy
    • Real time feedback
  • Scanned acquisition mode capability.

• Shall include a Hemispherical energy analyzers optimized to fast analysis, high sensitivity and energy resolution for XPS and UPS applications with the following characteristics:
  • excitation sources in magic angle geometry (54.7°),
  • straight forward data analysis.
  • Analyzer hemisphere mean radius greater than 120 mm and double metal shielding.
  • Low-noise, high-resolution kinetic energy measurement up to 2000 electron Volts(eV)
  • Three magnification modes
  • Six in-situ selectable apertures.
  • Operating modes:
    • Constant Analyzer Energy (CAE)
    • Constant Retarding Ratio (CRR).
  • chemical state mapping and identifying points of interest.
  • Deflection range greater than (10 mm x 10 mm)
  • Mapping of large and multiple regions of the sample.
  • Mean radius: 124 mm
  • Kinetic Energy: up to 2000 eV
  • Working distance (end of analyzer to sample): 30 mm
  • Pass energy range: 5 eV to 200 eV (continuous)
  • Magnification modes: 3

• Shall include a Scanning fine focus Ar+ ion source Depth Profiling Option Package with the following characteristics:
  • high-performance sputter etching, sensor cleaning,
  • depth profiling, and charge neutralization.
  • integrated into the software.
  • bundled to enable automatic measurement sequences.

• Shall include an Electron flood source for charge neutralization with the following characteristics:
  • Energy range 0.01 to 500 eV.
  • Sample current up to 100 μA.
  • Thoriated tungsten cathode.

• Shall include Calibration standards block with the following characteristics:
  • Faraday cup and reference samples: silver (Ag), gold (Au), copper (Cu).
  • Knife edge for spectral and spatial resolution.

• Shall include a Sample stage for up to 4” wafer samples. Remote stage controller for software-controlled sample manipulation and positioning with the following characteristics.
  • 5-axis UHV manipulator.
    • X/Y-travel: ±25 mm circle vector.
    • Z- travel: 200 mm (up to technical clarification).
    • Polar rotation: ±90° (subject to geometrical limitations, 60° with 4 inch sample plate in one direction).
    • Azimuthal rotation: ±180°.
    • Motorized actuation for all 5 axes.

• • Visual Sample Navigation provided by a high resolution CCD camera and interaction with the stage controller.
  • Scientific sample stage (option availability)
    • Temperature 160K to 1100K.
    • Electrically isolation for ground/bias capability.

• Shall include an Acquisition software system with the following characteristics:
  • modern high performance Win10 PC comes with all necessary hard- and software preinstalled, configured and pre-tested for operation including the acquisition software, data management tools and the commercial data analysis software including elemental libraries.
  • User-friendly control and acquisition software with simple and preconfigured standard experiments as well as the possibility to create experimental workflows adapted to specific scientific needs.
  • Automated experiment sequences such as depth profiling and multi-sample analysis can be performed.

• Shall include a Manipulator (5-axis motorized motion control).

• Shall include Full compatibility with all types of flag style sample holders in cluster and up to 4” standard wafer.

• Shall include a Central control system and software to provide the following characteristics:
  • Intuitive, user friendly operation
  • Full visualization of all vacuum system components.
  • Reliable industry-standard technology
  • Complete fast-status overview and control of valves, pumps, pressure gauges and bakeout equipment.
  • Preconfigured bakeout procedure, easily be adapted by the user.

• Shall include Interlocks to ensure a safe operation of the vacuum system.

• Shall include a Separate rack for the component electronics with small floor level footprint and casters with leveling feet, for easy alignment in the lab.

• Shall include an XPS system that comes completely assembled, fully tested as a turn-key system to enable fast and reliable implementation at the laboratory.

C. Responses:

All interested parties should notify this office by e-mail within the posted date.  Responses shall include:

1. To what extent each of the specifications can be met.

1.  Include your type of business (i.e. commercial, academia), whether your organization is classified as a large or small business based on $8.0M dollars that accompanies NAICS code 334516. If a small business, you must also list any small disadvantaged status you hold [HUBZone, 8(a), Service Disabled Veteran Owned Small Business (SDVOSB), Women Owned Small Business (WOSB), Economically Disadvantaged Women-Owned Small Business (EDWOSB), etc.].

1. Past experience/ performance through the description of completed projects.

(12) Responses to this sources sought are due no later than 11:59AM Eastern Standard Time (EST) on 14 July 2021. Submissions should be emailed to Crystal Demby, crystal.l.demby.civ@mail.mil.

Questions concerning this sources sought may be directed to Crystal Demby at crystal.l.demby.civ@mail.mil. Please be advised that .zip and .exe files cannot be accepted.

 (13) Place of Contract Performance: Army Research Laboratory

                                                         2800 Powder Mill Road

     Adelphi, MD 20783

(14) Estimated Delivery Timeframe or Period of Performance: Twenty-eight (28) weeks After Date of Contract (ADC).