Notice of Intent to Award a Sole Source Contract
Closed Special Notice Posted
This opportunity was awarded. See the award notice from .
- Solicitation number
- N00173-19-Q-KN03
- Agency
-
Office of Naval Research
Secretary of the Navy, Department of Defense
- Responses due
- Set-aside
- No set-aside
Opportunity facts
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- Place of performance
- 4555 Overlook Ave Sw Washington, District of Columbia 20375, United States
Notice details come from SAM.gov. Updated .
Notice text
The U.S. Department of Navy, Naval Research Laboratory (NRL) Contracting
Division, proposes to enter into a sole source contract with Oxford Instruments
America for the procurement of an Inductively Coupled Plasma (ICP) Reactive
Ion Etcher (RIE) Tool. The Tool must be capable of dry etching a wide
variety of materials including chalcogenide and silicate glasses. It must be
computer controlled via menu-driven software and be user friendly.
The contemplated contract type will be a Firm Fixed Price (FFP). This notice is
not a request for the receipt of proposals or competitive offers. A determination by
the Government to compete, or not, will be based on the responses received,
and is solely within the discretion of the Government. Information received will
normally be considered only for the purpose of determining whether to
conduct a competitive procurement.
The PSC is 3670 and the NAICS is 333242.
.
Files
| File | Type | Posted |
|---|---|---|
| Specifications_for_Optical_Sciences_ICP-RIE.pdf |
Notice history
| Notice | Type | Posted |
|---|---|---|
| Inductively Coupled Plasma Reactive Ion Etching | Award Notice | |
| This notice | Special Notice |
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