Notice of Intent to Award a Sole Source Contract
Award Notice Posted
- Solicitation number
- N00173-18-Q-KN03
- Agency
-
Office of Naval Research
Secretary of the Navy, Department of Defense
- Awarded
- to Oxford Instruments America, Inc.
- Set-aside
- No set-aside
Opportunity facts
- Contract number
- N0017318P2024 Federal contract award
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- PSC
- Not on record
- Place of performance
- 4555 Overlook Avenue SW Washington, District of Columbia 20375, United States
Notice details come from SAM.gov. Updated .
Notice text
The U.S. Department of Navy, Naval Research Laboratory Contracting Division, proposes to enter into a sole source contract with Oxford Instruments America, Inc., for the procurement of Chlorine Inductively Coupled Plasma (ICP) Reactive Ion Etching (RIE) Tool. The Chlorine ICP RIE Tool is required to have Cryo‐cooled Platen with ‐1400 C to 4000 C temperature range and a gas control cabinet that exactly aligns to the gas cabinet being replaced to include compatible software and a gas pod that will exactly match the existing gas pod which enables the hookup of gas lines.
The contemplated contract type will be a Firm Fixed Price (FFP). This notice is not a request for the receipt of proposals or competitive offers.
A determination by the Government to compete, or not, will be based on the responses received, and is solely within the discretion of the Government. Information received will normally be considered only for the purpose of determining whether to conduct a competitive procurement.
The PSC is 3670 and the NAICS is 333242.
Files
| File | Type | Posted |
|---|---|---|
| Specifications_for_III-V_etcher.pdf |
Notice history
| Notice | Type | Posted |
|---|---|---|
| Etch System | Award Notice | |
| This notice | Award Notice |
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