NIST NB686090-26-01960 Nitrogen RF Plasma Source

The National Institute of Standards and Technology seeks a nitrogen RF plasma source system for installation on a Veeco GEN 10 molecular beam epitaxy system, with quotations due August 12 and questions due August 6. The procurement is unrestricted, NAICS 334413 (Semiconductor and Related Device Manufacturing), with a small business size standard of 1,250 employees.

Place of performance and delivery is NIST Boulder at 325 Broadway Street, Boulder, Colorado 80305. The system comprises three line items: an RF plasma source for nitrogen gas with 4.5" CF flange, pyrolytic boron nitride construction, field-replaceable PBN aperture, high uniformity over a 76 mm diameter substrate at 8.75" source-to-substrate distance, in-vacuum length of 12.5 inches (317.5 mm), in-vacuum diameter of 2.09 inches (53 mm) or less, proven growth rate range of 0.2 m/h to 2 m/h for GaN in similar MBE systems, and compatibility with Molly Software Control; an RF power supply with 600 W maximum power, appropriate cables, and water-flow interlock; and an autotuner for RF load matching. All items must be new, not used or remanufactured, shipped in original manufacturer packaging, and delivered F.O.B. Destination with an 18-week lead time. The contractor must provide a minimum one-year warranty covering manufacturing defects. Payment is Net 30 days at 100% upon acceptance and successful completion of testing. Quotations must be firm-fixed-price for each line item with all shipping and delivery costs included and submitted electronically to Matthew Delgado at matthew.delgado@nist.gov. Award is made on best-value basis using a trade-off evaluation of technical capability and price factors. Quoters must maintain active SAM.gov registration at submission and through final payment.