Interference Lithography Stage System

Closed Pre-Solicitation Posted

Solicitation number
BZ-2025-11
Agency
Responses due
Set-aside
No set-aside

Opportunity facts

Place of performance
Berkeley, California 94720, United States

Notice details come from SAM.gov. Updated .

About this opportunity

Lawrence Berkeley National Laboratory is conducting market research through the Department of Energy to identify sources capable of delivering an Interference Lithography Stage System for the Center for X-Ray Optics. The procurement involves a specialized dual-stage system consisting of two separate assemblies: one designed to carry standard silicon wafers and another to carry a tray of optical gratings, with the grating mount requiring offset positioning or an open frame design to allow light passage from above to the wafer below. The system must operate within a high-vacuum environment at 1E-7 Torr pressure, requiring stages built to withstand vacuum conditions with minimal particle generation and outgassing properties. Potential vendors must demonstrate capabilities and experience in delivering precision vacuum-compatible stage systems that meet the laboratory's stringent operational requirements. Interested parties must submit responses to this Request for Information by August 25, 2025, with preliminary specifications and submission instructions provided in the attached RFI documents.

This procurement does not utilize any set-aside designations, making it open to all qualified contractors regardless of size or socioeconomic status. The RFI documentation indicates the system requires two distinct stage assemblies with different axis configurations - a two-axis wafer stage and a three-axis grating stage - both requiring extremely precise stability performance in the high-vacuum operating environment. The opportunity falls under NAICS code 334516 for Analytical Laboratory Instrument Manufacturing, reflecting the specialized nature of the scientific instrumentation being procured. No incumbent contractors, specific award values, or delivery timelines are mentioned in the available documentation, as this represents the initial market research phase of the procurement process. The vacuum chamber operating pressure specification of 1E-7 Torr indicates the highly specialized technical requirements that will likely limit the pool of qualified vendors to those with extensive experience in ultra-high vacuum systems and precision positioning equipment.

Notice text

Lawrence Berkeley National Laboratory is conducting market research to identify sources that possess the capabilities and experience necessary to deliver an Interference Lithography Stage System for the Center for X-Ray Optics.

The stage system consists of two separate stage assemblies: one will carry standard size silicon wafers, the other will carry a tray of optical gratings. Light will pass through the gratings from above and reach the wafer, which will require the grating mount to be offset from the stage body or to have an open frame stage assembly.

The stage system will be enclosed in a vacuum chamber with an operating pressure of 1E-7 Torr. The stages must be built to withstand the vacuum environment with low particle generation and also have minimal outgassing when the chamber is at operating pressure.

Please see the attached RFI documents for preliminary specifications and submission instructions.

Files

File Type Posted
BZ-2025-11.pdf PDF

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