Inductively Coupled Plasma (ICP) Etcher with Atomic Layer Etching (ALE)

Lawrence Berkeley National Laboratory (LBNL), part of the Department of Energy, is conducting market research to identify sources capable of providing an Inductively Coupled Plasma (ICP) Etcher with Atomic Layer Etching (ALE) capabilities for its Molecular Foundry nanoscience research facility. The equipment is needed to replace LBNL's existing tool and will support current projects while expanding research capabilities in quantum computing, sensing, and nanofabrication. Preliminary specifications include an ICP plasma source with 3kW maximum RF power, temperature range of -150°C to +400°C, liquid cooling capabilities, support for 200mm wafers, single-wafer processing, and compatibility with fragile substrates. The RFI requires respondents to submit product literature demonstrating compliance with specifications and indicate the country of origin for the instrument. Responses must be submitted via email to Karen Tays by 2:00pm Pacific on August 22, 2025, with LBNL warning that submitted information may be made public and should not include proprietary or confidential details.

This procurement opportunity has no set-aside designation and falls under NAICS code 333242 (Semiconductor Machinery Manufacturing) with a small business size standard of 1,500 or fewer employees. No incumbent contractors or potential award values are specified in the pre-solicitation notice. The RFI is purely for market research purposes and does not constitute a solicitation or commitment to purchase. The Molecular Foundry serves as a national user facility providing free access to state-of-the-art instruments and capabilities to researchers from academia, industry, and government laboratories worldwide. The procurement falls under PSC category 3693 (Industrial Assembly Machines) and involves single-unit equipment acquisition rather than multiple quantities or extended service timelines.