E-beam lithography system

NASA/LaRC has a requirement for an E-Beam Lithography System. The specificationsare linked above or may be accessed athttp://prod.nais.nasa.gov/cgi-bin/eps/bizops.cgi?gr=C&pin=. ]This notice is a combined synopsis/solicitation for commercial items prepared inaccordance with the format in FAR Subpart 12.6, as supplemented with additionalinformation included in this notice. This announcement constitutes the onlysolicitation, which is issued as a Request for Quotation (RFQ); quotes are beingrequested and a written solicitation will not be issued. Offerors are required to usethe On-Line RFQ system to submit their quote. The On-line RFQ system is linked above orit may be accessed at http://prod.nais.nasa.gov/cgi-bin/eps/bizops.cgi?gr=C&pin= . Theinformation required by FAR Subpart 12.6 is included in the on-line RFQ.The Government intends to acquire a commercial item using FAR Part 12 and the SimplifiedAcquisition Procedures set forth in FAR Part 13.Questions regarding this acquisition must be submitted in writing (e-mail is preferred)no later than 09/05/2011. It is the quoter's responsibility to monitor this site for therelease of amendments (if any). Potential quoters will be responsible for downloadingtheir own copy of this notice, the on-line RFQ and amendments (if any).An ombudsman has been appointed - See NASA Specific Note "B".Any referenced notes may be viewed at the following URLs link below.