Award of Sole Source Contract

Primaxx® uEtch Hydrofluoric Acid (HF) Vapor Micro Electro Mechanical Systems (MEMS) Etch Release System. The HF Vapor MEMS Etch System is to be installed within a Class 100 clean room at NSI, etch silicon oxide and to assist in the fabrication of freely suspended MEMS and Nano Electro Mechanical Systems (NEMS) devices, and is computer controlled via menudriven Windows 10TM-based environment software for multiple users. The system comprises of the following components:

a. A nickel-plated aluminum vacuum chamber;

b. Vacuum chamber must hold a 4-inch wafer;

c. System must use Anhydrous HF as the etchant and alcohol as the catalyst;

d. System must have a remote enable/disable feature using only a two-wire connection to enable/disable the tool for safety;

e. System control must have touch-screen operation;

f. Vacuum Pump System;

g. Water-cooled;

h. The system should have a Passive Dry Bed Chemisorber Gas Scrubber;

i. Possess an integrated hazardous gas detection system.

. Awarded Vendors: Primaxx, Inc.. Contract Award Dollar Amount: $221,300.00. Contract Award Date: 2018-09-19.