RFQ CR-314640 Attachment A.pdf

RFQ CR-314640

Technical Requirements for Scanning Electron Microscope

Attachment A December 24, 2020

The technical requirements for thermal gun – source scanning electron microscope (SEM) and accessory systems for chemical and structural analysis like EBSD (electron backscattered diffraction) and EDS (energy dispersive X-ray spectroscopy).

1. Scanning electron microscope (SEM)

a. Thermal source electron gun (LaB6 Gun)

i. Resolution: High vacuum mode (HV): 3.0-4.0 nm at 30KV, Low vacuum mode (LV): 4.0-5.0 nm at 30KV

ii. Magnification from 5X to 200,000X-300,000X

iii. Accelerating voltage: 0.5KV – 30KV

b. Specimen stage

i. X: 80-120mm, Y:80-120mm, Z: 50-80mm, Tilt: -10degree to 90degree, Rotation: 360degree

c. Computer control

i. User interface (UI) should be based on Window 10 OS, with high data storage capability

d. Automation Function

i. Automatic pressure control for low vacuum (LV) mode

ii. Automatic control for low voltage to high voltage mode

iii. Auto-confusing, contrast/brightness, and stigmatism

e. Imaging system

i. Graphic user interface should display resolution equal or above 1280 x

1024 pixels

ii. Able to store JPG, TIFF, or PNG file

iii. Look up tables for imaging enhancement

iv. Dynamic focusing and tilting correction imaging

v. Digital rotation linked with working distance (WD)

vi. Imaging database software including thumbnail albums, search functions, measurement, phase analysis, and report generation

vii. Dual or Quad display imaging mode

f. Detectors

i. Secondary ion detector

ii. Backscattered detector

g. Accessory for chemical and structural analysis

i. Sample chamber should be allowed for EDS (energy dispersive x-ray spectroscopy) and EBSD (electron backscattered diffraction) system.

ii. No required for another ports likes WDS (wave dispersive spectroscopy).

h. Specified requirements on EDS and EBSD system

i. EDS (energy dispersive spectroscopy)

1. SDD (Silicon Drift Detector (no required for LN2 (liquid nitrogen) cooling)

2. Resolution guaranteed with Mn K-alpha < 129 eV at 100,000 cps

3. Fully operational with software based on Window 10

4. Able to control microscope X,Y, beam energy

ii. EBSD (electron backscattered diffraction)

1. High speed and sensitivity detector with acquisition speed > 3000 cps (count per second)

2. Imaging size equal or above 1244 x 1204 pixels

3. Compatible with SDD type EDS detector

4. Fully automated motorized detector

5. Fully operational with software based on Window 10

6. Forward scattered detector system should be installed for symmetrical imaging.

7. Comparable with post-data analysis program, ex) strain measurement, local misorienation image, recrystallization, phase ID, texture grains, bright/contrast kikuchi patterns

iii. Advanced platform software for post-data analysis acquired from EDS and EBSD system

1. EDS and EBSD date should be fully integrated into the platform for easy access and storing.

2. Operational based on window 10.

Option for Trade-in of Existing SEM and Detectors:

The JEOL JSM 5910LV SEM that is equipped with Oxford instrumentation 1) high resolution electron backscattered diffraction (EBSD) and 2) energy dispersive x-ray spectroscopy (EDS).