NIST-SS27-01 - BMF Microscopes.pdf
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- Sources Sought Notice for new Microscopes
- Solicitation number
- NIST-SS27-01
About this file
This is a Sources Sought notice issued by the National Institute of Standards and Technology (NIST) seeking potential suppliers for new microscope systems for the Boulder Microfabrication Facility (BMF).
NIST requires microscope systems capable of inspecting semiconductor devices using optical techniques standard to the semiconductor industry within an ISO class 5 cleanroom environment. The systems must feature 200 mm stage travel in both x and y directions, dual manual and computer-controlled operation through motorized components (stage, turret, prism), and magnification ranging from 25x to 1000x through a combination of eyepieces and objectives. A multi-objective turret with six positions is optimal. The systems must include an integrated camera system with publication-quality image resolution, integrated software for communication, control, and image analysis typical of semiconductor industry standards, and support multiple imaging modes and filters including transmission, reflection, darkfield, DIC (Nomarski), and yellow light filtration. Physical constraints require the system to fit on a 3-foot by 3-foot tabletop with weight compatible with pneumatic floating tables. These microscopes are critical to NIST's mission-critical device fabrication processes at the BMF.
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Text version
Notice ID Number NIST-SS27-01
Sources Sought BMF Microscopes
NIST seeks sources capable of providing new microscopes.
The Boulder Microfabrication Facility (BMF) is an ISO class 5 cleanroom that micro- and nano- fabricates devices to meet the NIST mission. Part of the fabrication process is being able to inspect substrates under a microscope. The BMF requires new microscopes to be able to fabricate its NIST mission critical devices.
Specific Requirements for the microscopes are:
• Must be able to inspect semiconductor devices with optical techniques that are common to the semiconductor industry
• Compatible with an ISO-5 cleanroom
• Capable of 200 mm stage travel and both x and y
• A system that can be both fully manually and computer controlled. This can be accomplished by the use of motorized components (stage, turret, prism)
• Magnification powers of 25x - 1000x using a combination of eyepieces and/or objectives
• A multi objective turret (optimally is 6 turret)
• Camera system and software to take pictures with resolution high enough for publication quality images.
• All parts of the system shall have an integrated software package to communicate, control, and perform image analysis as typical in the semiconductor industry
• Multiple imaging modes and filters such as transmission, reflection, darkfield, DIC
(Nomarski), yellow light filter, and any other imaging methods and/or filters that are traditionally used in the semiconducting industry.
• System should fit on top of a 3 foot by 3 foot tabletop with a system weight that is compatible with a pneumatic floating table
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