Attachment 1-Tergeo Plasma Cleaner Specifications.docx

Tergeo Plasma Cleaner System Specifications NRL code 6392 requires a Tergeo Plasma Cleaner System to meet the stringent requirements of the unique needs of ongoing and future research programs. Specifically:

1. On-board plasma intensity sensor with quantitative readouts crucial for reproducibility of our research platforms and ability to transition technologies.

2. High frequency (greater than 10MHz) RF (radio frequency) power, as plasma in the less than ~1MHz RF range is known to cause ion-sputtering damage and metal contamination for sensitive surfaces.

3. An integrated remote plasma source that eliminates energetic ion sputtering that occurs in immersion of a direct plasma source, reduces sample damage due to excessive heating, charging and ion bombardment ideal for delicate sample surfaces.

4. External RF electrode design applies a uniform plasma across the chamber, ensuring batch/sample consistency.

5. High purity quartz chamber/sample holder – many alternative brands utilize aluminum or some metal for the chamber/sample holder, which inhibits uniform plasma across the chamber and introduces possible sources of contamination.

6. The ability to apply either continuous or pulsed plasma at 1 watt intervals, ranging from 40-150 watts, crucial for reliably applying weak plasma for our delicate nanostructured surfaces.

7. Water vapor plasma capability to generate high-density O.H.* hydroxyl functional groups on our surfaces

Tergeo Plasma Cleaner System parts needed to create a fully functional system meeting the above requirements: