A.2a Technical Specs.pdf

This document is a Technical Specification for an NSLS-II IXS Beamline Laterally Graded Multilayer Mirror, developed by Brookhaven National Laboratory for the U.S. Department of Energy. The specification details the technical requirements for a specialized mirror designed for a state-of-the-art x-ray scattering beamline, with a focus on exploring THz-nm dynamics of liquid and solid materials.

The technical specifications outline precise requirements for the mirror, including an operating x-ray energy of 9132 eV, focal spot size of ≤16 μm, incident beam acceptance of 2.1 x 2.1 mm², and average reflectance of ≥75%. The mirror substrate will be manufactured from silicon with strict tolerances on slope error and micro-roughness. The multilayer coating will use a W/Si system with specific parameters for Bragg angle, target period thickness, and deflection angle. The document includes detailed specifications for substrate characteristics, coating parameters, and mounting provisions, with acceptance criteria requiring documentation of substrate properties and x-ray reflectivity measurements.