218669-DD-10 Sputter System Request for Information.docx
DoD Form DOCX document 14 KB Posted
- Attached to
- Sputter System
- Solicitation number
- 218669-DD-10
- Issued by
-
Department of Energy
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Other versions and copies of DD Form 10
| File | Revision | Posted | Attached to |
|---|---|---|---|
| dd10-10170201supp12 foa final 5.14.12.doc | May 14, 2012 | — | |
| dd10-1015e final 02.23.10.doc | Feb 23, 2010 | — | |
| dd10-001 amend i 02.22.10.doc | Feb 22, 2010 | — | |
| RFP - 218669-DD-10 - Sputter.doc | Revision not stated | Sputter System | |
| cdc-rfa-dd-10-1006 amended final 06 24 10.doc | Revision not stated | — | |
| cdc-rfa-dd-10-1005 amended final 06 24 10.doc | Revision not stated | — | |
| cdc-rfa-dd10-1004 foa final 06 07 10.doc | Revision not stated | — | |
| cdc-rfa-dd10-1007 final 06 07 10.doc | Revision not stated | — | |
| cdc-rfa-dd-10-1015e final 05 25 10.doc | Revision not stated | — | |
| cdc-rfa-dd10-1017 foa final 5 12 10.doc | Revision not stated | — | |
| cdc-rfa-dd10-1006 final 05 06 10.doc | Revision not stated | — | |
| cdc-rfa-dd10-1010 new final 4 30 10.doc | Revision not stated | — | |
| cdc-rfa-dd10-1014 revised final 04 7 10.doc | Revision not stated | — | |
| cdc-rfa-dd10-1016 final 03 26 10.doc | Revision not stated | — |
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Who attaches DD Form 10
| Agency | Files |
|---|---|
| Department of Energy | 2 |
Other files
| File | Type | Posted |
|---|---|---|
| RFP - 218669-DD-10 - Sputter.doc | DOC document | |
| COMMERCIALSupply Exhibit C 3-23-10.doc | DOC document |
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Text version
218669-DD-10 Sputter System Request for Information (RFI) 17 Aug 10
Question: Is the application for production or R&D?
Answer: This system will be used for R&D.
Question: Is this for a single substrate or multiple substrates?
Answer: Multiple substrates.
Question: What size and shape is/are the substrate?
Answer: As small as a ¾” X 1” oval to a diameter of about 6”.
Question: Is there any uniformity specification?
Answer: With the size of the substrate with respect to the size of the target, there will not be a concern with uniformity. We will have the substrates mostly towards the center of the target.
Question: How thick of a film is to be deposited of the various materials?
Answer: The thinness films would be approximately 50Å on some substrates and up to a thickness of about 2µm on other substrates
Question: Is there a need for substrate heating? If so, to what temperature?
Answer: Yes we would like to have the option of substrate heating up to about 100˚C
Question: Is there a need for substrate cooling? If so, to what temperature?
Answer: No, we do not require substrate cooling.
Question: Is there a need for substrate rotation?
Answer: No, we do not require substrate rotation.
Question: Can the loadlock be separately pumped with a turbopump instead of a cryo?
Answer: Yes, the loadlock can be pumped with a turbo pump as long as the backing pump is a dry pump.
Question: Do you require a manually operated transfer arm for the substrate?
Answer: No, we do not require a transfer arm
Question: What gas(es) is/are are required for the sputtering process?
Answer: Our current processes only require argon as our process gas. However we do require CDA for the pneumatics and nitrogen for vent and purge gas
Question: Is there an ultimate pressure requirement?
Answer: The ultimate pressure would be 2.0 X10-7 Torr
Question: What is the reason for the very high powered power supplies?
Answer: We are looking into other materials that may require higher current for sputtering.
Question: The request asks for two 10Kw DC power supplies. We would like to offer the system with the standard one supply switching sequential setup.
Answer: Yes…one standard supply switching sequential setup is acceptable.
Question: The request also asks for a 10.6 cfm dry scroll pump; this is too small for this size system. (We will) offer a proper sized dry pump as an alternative.
Answer: Yes, please submit alternated in the quote.
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