(1) Statement of Work Advanced X-ray Analysis for Additive Manufacturing dated April 24 2025-002.pdf

Correlative analysis of the manufacturing process with chemical and structural characterization data are required to determine the relationship between the process-structure-properties of novel materials or materials fabricated using novel manufacturing approaches. Chemical and structural characterization data are particularly important for developing feedstock for additive manufacturing by enable a comprehensive understanding batch-to-batch variability and the effects of variabilities on the structure of fabricated components. Fully understanding the process-structure-properties linkage is critical for accurately predicting how a component will function in use and the service lifetime.

The complication with AM technologies is that defect structure and microstructure can vary within an actual component depending on the geometry of the part, the processing parameters and scan strategy used to fabricate the part, and the specific material being processed. Therefore, detailed in-situ and ex-situ characterization of each AM component must be performed in which information is spatially tracked relative to the computer generated intended geometry (CAD file).

To enable project success, ORNL is looking to expand their capabilities in analytical X-ray analysis of additive manufacturing.

Specifications:

X-ray Diffraction System:

• The system must a modular design that allows easy change of optic and stage configurations

• The system must have a minimum of a 4 kW solid-state generator

• The system must have a 45 position sample change

• The system must support both ambient and non-ambient stages

• The system must have a motorized stage that supports large samples with a maximum height of

100 mm.

• The system must have the capability to measure temperature dependent data up to 1500oC

• The system must have a Cu-anode X-ray source

• The system must have beam current ranges at the following accelerating voltages: 1 pA to 300 nA at 30 kV and 1 pA to 100 nA at 5kV

• The system must have a detector that meets the following:

o Large active area > 100 mm2 o Energy resolution (<5 %) to mitigate fluoresces o Low detector dark background (< 1cps overall) o detection efficiency of >90% for Cu Kalpha and > 35% for Mo Kalpha o Detection linear range of > 1.6 106 cps overall

• Cross-instrument correlative sample capability either through existing software or through API access across the systems in this RFI

• Data analysis software capable of automated whole-pattern and cluster analysis with autogenerated reporting

• The system must use a none-proprietary data format

• System must have a footprint less than 1.5 x 1.5 meters

Statement of Work Advanced X-ray Analysis for Additive Manufacturing

Dated April 24, 2025

X-ray Fluorescence (XRF) System:

• The system must contain both wavelength-dispersive and energy-dispersive XRF and can be ran in parallel

• The system must have the ability to change samples without venting of the optical chamber each time

• The system must have an integrated X-Y-X sample changer and allow for unattended operation

• The system must be able to swap samples without the need to deenergize x-ray tube

• The system must have a minimum of a 2.4 kW x-ray tube

• The system must contain a minimum of 3 different crystal types for elemental analysis

• The system must contain a high-precision goniometer for positioning

• The system must contain a scintillation detector for enhanced sensitivity for elements greater than

Mn

• The system must have the ability to run loose powders

• The system must utilize a standardless analysis software for the identification of unknown alloys or where a standard is not available

• The system must contain all sub-assemblies for operation and only require external utilities

• The system must run from 230V power

• The system must come with a chiller unit

• The system must come with a variety of beam filters and collimators

• The system must come with a variety of programmable sample masks ranging from 6mm to

37mm

• The system must come with a variety of standards

• The system must come with training

• The system must have wheels for easy mobility

• Cross-instrument correlative sample capability either through existing software or through API access across the systems in this RFI

• The system must use a none-proprietary data format

• System must have a footprint less than 1.5 x 1.5 meters

Other Requirements:

• Seller will provide on-site installation and training for both systems and all options

• Installation for both systems to be completed with 30 weeks of issuance of PO

Statement of Work Advanced X-ray Analysis for Additive Manufacturing

Dated April 24, 2025