1. RFI_-_TEM_2025-12-15.pdf

Request for Information

200kV Workhorse Transmission Electron Microscope

Overview

The Center for Functional Nanomaterials is planning to acquire a 200 kV cold-field-emission-gun (CFEG) high resolution transmission electron microscope (HRTEM)/scanning transmission electron microscope (STEM) equipped with high resolution pole piece, energy dispersive X-ray detector, and electron energy loss spectrometer. High efficiency detectors for both transmitted electrons and secondary electrons are required.

1 General

1.1 This specification describes the requirements for a 200kV workhorse cold-field-emission-gun (CFEG) high resolution transmission electron microscope (HRTEM)/scanning transmission electron microscope (STEM) for the Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory. The microscope shall be designed to provide an optimum combination of capabilities for high-resolution imaging, energy dispersive X-ray spectroscopy (EDS), electron energy-loss spectroscopy (EELS), and nanoscale electron diffraction. This instrument is required to operate at 200kV and 80kV. High efficiency detectors for both transmitted electrons and secondary electrons shall be included.

1.2 Principal capabilities of the microscope include, but not limited to, atomic-resolution characterization of structure and defects, elemental composition, chemical (e.g. valence), bonding, and electronic properties of nanoscale materials.

1.3 The electron microscope shall be a high-resolution instrument for imaging, diffraction and spectroscopy. It shall offer high quality of combined accomplishments in spatial and energy resolution, mechanical stability, and high vacuum.

2 Configuration of the system

2.1 Principal Configuration of the Microscope

The electron microscope must not be aberration corrected.

2.1.1 The electron microscope is defined as a cold field emission gun high resolution/scanning transmission electron microscope with post-specimen diffraction, energy dispersive x-ray spectroscopy, electron energy-loss spectroscopy, high angle annular dark- field STEM detector, bright field STEM detector and backscattered electron image detector.

2.1.2 The microscope must have a cold field emission electron source.

a) The source must have a high brightness of 8 x 108 A/cm2 sr (or higher), giving 2.5 nA of current in a 0.7 nm probe.

b) The source is capable of a wide range of probe and gun extraction settings to satisfy gentle-beam, high-current analytical, and high-energy-resolution modes, while maintaining high spatial resolution.

Center for Functional Nanomaterials

c) The probe current has a high degree of stability (>90% probe current retention 4-6hr after a tip flash).

d) The vendor must demonstrate commercially available TEM CFEG technology of considerable longevity (>10 years), with existing toolsets exhibiting continued and reliable performance.

2.1.3 TEM (point) resolution is guaranteed to be 0.23nm or better. STEM resolution is guaranteed to be 0.136nm or better. EELS (optional) energy resolution is guaranteed to be 0.3eV or greater.

2.1.4 The microscopy must have an independent Descan system (coils and control) post specimen, to allow large areas to be mapped by EELS without artifacts caused by the shifting of the EELS spectrum on the spectrometer.

2.1.5 The EDS system must consist of at least two large (100 mm2 or greater) silicon drift detectors (SDD), offset 90° degree from each other, with a solid angle of >= 1.7 steradians at a resolution of 133 eV (or better) at Mn Kα. The system must have a high P/B ratio of 4000 or more, while maintaining minimal contribution from spurious peaks (1.0% or less).

2.1.6 The microscopy must be equipped with an automated sample holder loading system. The user must be able to load the TEM sample holder into the autoloading system, push a button, and have the specimen holder automatically loaded in the TEM.

2.1.7 The required imaging modes shall include high-angle annular dark-field (HAADF) and bright field (BF) imaging, both in STEM mode. All types of image modes shall be operated separately or simultaneously.

2.1.8 The required diffraction modes shall include convergent-beam diffraction, micro-beam diffraction, nano-beam diffraction and Ronchigram acquisition.

2.1.9 Other operation modes include, but not limited to, electron energy-loss spectroscopy (optional), conventional transmission electron microscopy (CTEM) imaging, secondary electron imaging (SEI) and free-lens control mode for magnetic imaging.

2.1.10 Ronchigram and diffraction pattern shall be recorded on a 4kx4k CMOS camera for both convergent beam and parallel beam electron diffraction.

2.1.11 The TEM stage must be operable through piezoelectric drives in three dimensions (X, Y, Z).

2.1.12 Electrostatic dose modulator (EDM) system shall be provided as fast beam blanking system with a pre-sample electrostatic deflector with which the beam can be switched on/off in less than 50ns for dose control on the sample.

2.1.13 The microscopy must be equipped with an ECO mode, an environmentally friendly mode that minimizes the power consumption of the microscopy when it is not in use.

2.1.14 Principal components shall include:

a) Cold field emission electron gun (CFEG) operated at 20-200 kV.

b) Electron microscope column operated at 20-200 kV.

c) High resolution polepiece.

d) Noise cancelling quadruplet CL aperture.

e) Motor drive quadruplet IL aperture with aperture diameter 100, 50, 20 and 10µ𝑚.

f) Motor drive Faraday cage hard X-ray aperture.

Technical Specifications

g) High-stability 5-axis sample goniometer (X, Y, Z linear motions and alpha, beta sample tilts) with ±30° tilt. Maximum specimen tilting range to ±80° with high tilt holder. Drift correction for both TEM and STEM mode shall be provided.

h) Motor- and piezo-driven X, Y, Z specimen stage.

i) A single tilt holder with 30° tilt in a single axis and a reinforced, low background (analytical) double-tilt holder with ±30° tilt on two orthogonal axes shall be provided.

j) High angle annular Dark Field (HAADF) STEM detector, Bright Field (BF) STEM detector.

k) Backscattered electron image detector on the side of the incoming beam with resolution of

1nm or better.

l) Fast CMOS camera with 4kx4k pixels for 2D diffraction pattern/Ronchigram pattern detection, and 4D-STEM.

m) At least two 100mm2 or greater silicon-drift EDS detectors.

n) Auto sample holder loading/unloading system with one button operation mode.

o) Motorized beam stopper for electron diffraction to protect camera.

p) Fluorescent screens (large and small) and binoculars shall be provided to visualize TEM images and electron diffraction.

q) A water chiller system and 200-240V universal power supply (UPS) shall be provided.

r) User-friendly instrument-control panel, computers, data acquisition and automation hardware and software, and data processing and analysis software (Gatan Microscopy Suite

Software or equivalent).

s) Flat-screen monitors displaying microscope’s operating conditions, instrument parameters

(e.g., acceleration voltage, magnification, camera length, specimen position and tilt).

2.2 Optional Configuration of the Microscope

The configuration below must be provided by vendors as optional to be installed later.

2.2.1 High Energy Resolution Electron Energy Loss Spectrometer with energy resolution of 0.3eV or better, without the use of monochromator, as measured by full width half maximum of the zero low peak in an EEL spectrum.

2.2.2 Nanometer pattern generation system (NPGS) for nanoscale lithography, with control of the fast beam blanking system.

2.2.3 High tilt holder for tomography ±80° tilt on two orthogonal axes, and corresponding software.

2.2.4 Nanomegas 4D-STEM for nanoscale strain mapping, electronic-magnetic field mapping, orientation imaging and phase mapping.

3 Power, Environment and Safety

3.1 Vendor shall be responsible for installation of all components and provision of all interconnecting power, communication, control and instrument cabling, and all piping, and tubing between components and to the supply points identified by BSA.

3.2 The system shall be compatible to use standard electrical wall socket (110 VAC, 15A).

Center for Functional Nanomaterials

3.3 All electrical installations shall comply with applicable codes and shall be certified for safe use (NRTL approval and certification).

3.4 Equipment shall be designed with protective housing to contain UV and laser radiation, safety interlocks and access controls where applicable, labels and warnings in accordance with industry standards (21 CFR 1040, IEC 60825 standards)

Questions

1. What are room requirements for the instrument (temperature control, electricity, vibrational etc.)?

2. Can you provide onsite training after installation?

3. Does the tool have electrical safety certification equivalent to UL/ETL/NRTL?

4. If certain requirements cannot be met, please indicate what can be achieved and demonstrated.

5. Would the system be manufactured in the United States? If so, does it meet the definition of domestic end product as defined at FAR 25.101(a). If not, what is the country of origin of the product?

6. What kind of warranty or servicing plan products do you offer?

7. Can you provide fixed price service contract for the first 5 years?

8. Could you please share a list of similar tools (no less than 10) that the vendor has installed in

US/Worldwide research institution/facilities (specified in the list).

9. Please specify if the company's proposed product is considered a commercial product as defined in FAR 2.101.

10. Is your company registered in SAM.gov? If so, please provide company Unique Entity

Identification (UEI) Number.

Please provide a statement of capabilities as it pertains to meeting the above specifications and answers to the questions above.