Low doped SIC epiwafers for room temperature, ultrafast, and radiation hard sensors

Ended Project Grant Awarded Last action

Award ID
DESC0024768
Recipient
Awarding agency
Obligated
$199,985

Award facts

Completion date
Place of performance
Rockledge, FL, USA

Award details come from USAspending.gov.

About this award

This $199,985 federal Project Grant award was provided by the U.S. Department of Energy (DOE) Office of Science Financial Assistance Program (CFDA 81.049) to Mainstream Engineering Corp, a for-profit manufacturer based in Rockledge, Florida. The funding will support the development of low-doped silicon carbide (SiC) epiwafers for room temperature, ultrafast, and radiation-hard sensors. The award has a period of performance from February 12, 2024 to February 11, 2025. The DOE Office of Science program focuses on funding fundamental research and technology development to further scientific understanding and support U.S. energy, economic, and national security priorities. Through this grant, Mainstream Engineering Corp will contribute to advancing SiC material science and semiconductor sensor technologies with potential applications in areas such as radiation detection and high-speed electronics.

Subawards

Subrecipient Amount Awarded
The Pennsylvania State University Mainstream has been funded by the US Department of Energy (DOE) to develop ultra-high purity, unintentionally-doped SiC epitaxial films for use in room… $65,000

Quick answers

Who received award DESC0024768?

DESC0024768 was awarded to Mainstream Engineering Corp by Office of Science (Department of Energy) on February 12, 2024.

How much is award DESC0024768 worth?

$199,985 has been obligated on DESC0024768.

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