Electron Beam Deposition System

Added: Jun 15, 2017 3:25 pm The proposed system is an Electron Beam Deposition System.  NRL requires an Electron Beam Deposition System capable of fabricating thin films of high melting temperature materials onto conducting, insulating and semiconducting substrates under high vacuum conditions.  These films are to be subsequently lithographically patterned into various electronic devices.  In order to reduce pump down time per cycle and minimize source and substrate heater contamination, the vacuum chamber is to consist of two separate sections.  An electric hoist with swing-out source tray to facilitate access of the ebeam gun for cleaning, maintenance as well as material source reloading and shield removal/cleaning.  The lower source chamber is to be separated from the upper product chamber by a high vacuum isolation valve which would allow the sources to remain under vacuum during substrate loading.  The system is to be installed within a Class 100 clean room, and must be compatible with the requirements of that site.  It's intended for use by multiple users within that site, therefore it must be computer controlled via menu-driven software, can be monitored from a location outside the clean room, and be user friendly.