Atomic Layer Deposition (ALD) Reactor System
Closed Solicitation Posted
- Solicitation number
- N00173-26-Q-TB02
- Agency
-
Office of Naval Research
Secretary of the Navy, Department of Defense
- Responses due
- Set-aside
- Total Small Business
Opportunity facts
- NAICS code
- 334513 Instruments and Related Products Manufacturing for Measuring, Displaying, and Controlling Industrial Process Variables
- PSC
- 6640 Laboratory Equipment And Supplies
- Place of performance
- Washington, District of Columbia, United States
Notice details come from SAM.gov. Updated .
About this opportunity
The Department of the Navy Office of Naval Research seeks an Atomic Layer Deposition (ALD) reactor system for thin film growth applications, with proposals due September 14, 2026. This acquisition is set aside 100 percent for Women-Owned Small Business (WOSB) concerns.
Place of performance is Washington, DC, with delivery to the Naval Research Laboratory at 4555 Overlook Avenue SW, Washington, DC 20375-5328. The requirement comprises three line items on a firm fixed-price basis: the ALD system itself (delivery by June 30, 2027), installation services (July 16, 2027), and training services (July 30, 2027), each with a quantity of one.
The ALD reactor must be a single hot-walled, viscous flow reaction chamber in stainless steel and copper-free construction, capable of operating in both thermal ALD and plasma-enhanced ALD (PE-ALD) modes. Technical requirements include a heated chuck accommodating substrates up to 150 mm diameter; a minimum of eight precursor sources upgradeable to twelve; four minimum process gas lines; an Inductively Coupled Plasma source with 50–1000W RF power at 13.56 MHz; optical ports for in situ ellipsometry; substrate heating from ambient to greater than 450°C with 3% uniformity; delivery line heating to 200°C or higher with 5% uniformity; a single wafer load-lock reaching 5×10⁷ Torr in under 5 minutes; an automated sample transfer system using linear rack-and-pinion technology; and Windows-11 or later computer control with dedicated ALD software. The NAICS code is 333242, Semiconductor Manufacturing Equipment, with a size standard of 1,500 employees. The PSC code is 6640, Laboratory Equipment and Supplies. Evaluation prioritizes technical capability and specification compliance, followed by past performance and price reasonableness. The Government Representative is Neeraj Saraf. Contact TaLisa Boyd at 202-923-1276 or talisa.m.boyd.civ@us.navy.mil for solicitation information.
Notice text
COMBINED SYNOPSIS / SOLICITATION FOR COMMERCIAL ITEMS
This is a combined synopsis/solicitation for commercial products or commercial services prepared in accordance with part 12. This announcement constitutes the only solicitation. Offers are being requested and a separate written solicitation will not be issued.
Solicitation number N00173-26-Q-TB02 is issued as a request for quotation (RFQ) for an atomic layer deposition (ALD) reactor for the uniform and conformal deposition of oxide, nitride, and metal films with atomic-layer precision onto substrates of high aspect ratio surface topographies using both traditional thermal atomic layer deposition (ALD) and plasma enhanced ALD (PE-ALD) modes.
This acquisition is set-aside for small business concerns. This solicitation incorporates provisions and clauses by reference. The full text of provisions and clauses may be accessed electronically at www.acquisition.gov.
The Defense Priorities and Allocations System (DPAS) and assigned rating are DO-C9.
See solicitation attachment, below.
Files
| File | Type | Posted |
|---|---|---|
| ALD Specifications.pdf | ||
| N00173-26-Q-TB02 FOR ALD SYSTEM - Posted 01 Sept 2026.pdf |
Notice history
| Notice | Type | Posted |
|---|---|---|
| This notice | Solicitation | |
| Atomic Layer Deposition (ALD) Reactor System | Pre-Solicitation |
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