SOW Femtosecond Laser.docx
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- IASS - Femtosecond Laser Machining
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- F4FBBL0245A101
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Statement of Work
For
CNC Femtosecond Laser
Project Title: Femtosecond Laser Machining
Document Date: 21 April 2020
Objective and Scope: Acquisition of one femtosecond laser machining system
1. Background: AFRL/RYD needs to acquire a femtosecond laser machining system due to an increased capability need. RYD currently has a microsecond CO2 laser machining system installed primarily for copper patterning on cladded circuit board materials. RYD requirements have increased to require high precision cutting and drilling on a wide variety of materials with minimal thermal damage to the substrates, in addition to copper patterning already required.
2. Minimum Requirements: RYD requires a flexible laser system compatible with a variety of different projects currently ongoing as well as expected future projects. Detailed requirements listed below:
· A system footprint no larger than 6ft wide x 6ft deep x 10ft tall
· Fiducial recognition for alignment
· Ability to process at least 12in x 18in substrates (can be stitched as long as its automatic stitching)
· Ability to handle different file types, including but not limited to: dxf, gerber, gds
· Laser cutout with very small curf (<25microns) through a variety of substrates up to 60 mil thick.
· Laser drilling of holes down to 25microns in diameter.
· Substrate flexibility
· Circuit board materials up to 60mil thick
· FR4, rogers 4003C, rogers 4350B, Rogers CLTE-AP, Duroid 6002, Duroid 6202, LTCC, Dupont Pyralux, Itera MT
· Semiconductor and Insulator materials up to 500microns thick
· Silicon, Quartz, Alumina, Silicon Carbide, Borosilicate
· Able to process all materials with no carbon deposits and minimum thermal damage (melting/cracking) to the substrates.
Delivery Schedule: As soon as possible after contract award
Delivery Destination: 2241 Avionics Circle, Area B, Building 620, Wright-Patterson AFB, Ohio
Inspection and Acceptance: Both inspection and acceptance will be by the Government at Destination.
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