SOW.docx

Statement of Work BMF Photomask Substrates

I. Background Information:

NIST-Boulder has a state-of-the-art research laboratory to support the most sensitive research done at NIST. Included in this building is a Class 100 microelectronics fabrication facility, called the Boulder Micro-Fabrication Facility (BMF). The BMF patterns and utilizes master reticles (also called masks) to fabricate microelectronics circuits. These reticles are patterned in-house using our optical pattern generator using photomask substrates, and then are used in the optical wafer stepper to transfer the pattern onto the wafer being processed. Our current stepper requires 6” photomask substrates made to exacting semiconductor standards (SEMI Spec SEMI P1-0708). These photomask substrates consist of a 6” square transparent substrate (soda-lime glass) coated with a Chromium (Cr) based opaque material and photoresist.

II. Scope of Work:

The goal of this contract is to provide the BMF with an initial order of 80 to 320 photomask substrates, depending on the Government’s needs. Provide the BMF with a mechanism to procure reticle blanks as the need arises. Provide all new items. Refurbished plates are not acceptable.

III. Minimum Requirements:

The Contractor shall provide photomask substrates that meets all technical specifications identified below. All items must be new. Used or remanufactured equipment will not be considered for award. Experimental, prototype, or custom items will not be considered. The use of “gray market” components are not authorized for sale in the U.S. by the Contractor is not acceptable. All line items shall be shipped in the original manufacturer’s packaging and include all original documentation and software, when applicable.

Line Item Number: 0001 Description: Photomask substrates Quantity: minimum of 400 photomask substrates and a maximum of 1520 photomask substrates.

Specifications:

1. The contractor shall supply the Government with reticle blanks that conform to SEMI Specs SEMI P1-83 and P2-86: “SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES”.

2. Material: Soda lime glass

3. Size: Min 151.6 mm Max 152.4 mm (nominal 6”)

4. Thickness: 3.05 +/- 0.1 mm (nominal 0.12”)

5. Squareness: < 8 parts/thousand

6. The following must be met in a circle of quality of 100 mm diameter

a. Flatness: 15 m or better

b. Cr nominal thickness: 95 nm -115 nm

c. Cr thickness variation: < 10 nm

d. Optical density: >= 3 @ 635 nm

e. Pinholes: 0 > 5m

f. Photoresist: AZ1350 or equivalent – 500 nm thick

g. Surface particles: 0 > 10 m:

i. At the award of the contract, the contractor shall supply the government with between 80 to 320 photomask substrates that meet the required specifications depending on the Government’s requirements at the time of award.

ii. During a time period of 1 year after award of the contract, the Government may require additional photomask substrates that meet the required specifications. During the lifetime of the contract, the Government shall have the ability to purchase additional photomask substrates. Each purchase shall be in increments of 80 photomask substrates.

iii. The Government will purchase a minimum of 400 photomask substrates and a maximum of 1520 photomask substrates during the year of the contract. The initial order of 400 photomask substrates shall count towards this minimum and maximum amount.

iv. The contractor shall be responsible for all shipping and the reticles shall be packaged in a way that is compatible for use in an ISO Class 5 cleanroom.

Line Item Number: 0002 OPTION Description: Photomask substrates Quantity: minimum of 400 photomask substrates and a maximum of 1520 photomask substrates.

Option Execution: NIST can execute this option within one (1) year of award.

Specifications:

i. The contractor shall provide the same service described in CLIN 0001 for an additional year that starts when the year in CLIN 0001 ends, with the exception that the Government is not obligated to place an order at time of exercising this option. The Government reserves the right to order the number of photomask substrates it needs when exercising the option which can range from 0 to 1500 plates.

ii. The Government will purchase a minimum of 400 photomask substrates and a maximum of 1520 photomask substrates during this option year of the contract.

IV. DELIVERABLES

I.

V. PLACE OF PERFORMANCE

All work shall be completed at the contractor’s facility.

VI. DELIVERY TERMS

Delivery shall be F.O.B Destination and shall occur in accordance with the delivery due dates provided in the above table.

FOB Destination means: The contractor shall pack and mark the shipment in conformance with carrier requirements, deliver the shipment in good order and condition to the point of delivery specified in the purchase order, be responsible for any loss of and/or damage to the goods occurring before receipt and acceptance of the shipment by the consignee at the delivery point specified in the purchase order; and pay all charges to the specified point of delivery.

The contractor shall deliver all Line Items to:

325 Boulder Colorado Boulder, CO 80305

VII. INSPECTION & ACCEPTANCE

In addition to the inspection and acceptance terms articulated in 52.212-4, the Government reserves the right to perform such performance tests and evaluations as defined below to verify specified system performance. Such tests and evaluations, if performed, shall be conducted within the environment that the system is to be operated. The Contractor has the right to be present during the tests and evaluations, if performed, at the Contractor’s expense.

NIST may choose at its discretion to forego this part of acceptance testing.

A visual inspection of the equipment will be performed by the NIST COR to identify surface defects or any form of indication that any equipment was damaged during transport to NIST. The Government shall have sole discretion to require repair or replacement of damaged and/or nonconforming supplies at no cost to the Government. The Government at any time prior to acceptance shall reject the equipment due to defects and/or nonconformance. The vendor is responsible for latent defects discovered any time after final inspection. However, the extent of its liability shall be prorated over the useful life of the equipment.

Ownership of the equipment shall transfer to NIST upon acceptance by the Government.

The Government will test, inspect, and accept or reject the equipment within 1 week of the receipt of the equipment unless otherwise indicated above. The Government reserves the right to conduct quality assurance testing to confirm that a given instrument(s) meets the manufacturer’s and/or the Government’s performance specifications. It is anticipated that the equipment will meet all manufacturer’s specifications and/or the Government’s performance specifications identified in the most recent operations and maintenance manual for each piece of equipment and/or in this document.

VIII. PAYMENT SCHEDULE

Advance payment is not authorized. The Contractor must invoice in arrears according to the payment schedule. The Contractor shall be paid, in accordance with Net 30-day payment terms, upon receipt and acceptance of a proper invoice, in accordance with the following schedule:

100% upon inspection and acceptance of fully delivered photomask substrates.