ION_BEAM_SPUTTERING_SYSTEM.docx

South Bay Technology, Inc. shall diagnose and repair known problems with the IBS/E KDC dual sputtering system (serial # IBSE-KDC-1548) within 30 days of receipt of this order. The evaluation and repairs on the instrument are to be completed at South Bay Technology, Inc. The three known issues that need to be addressed are:

1.Unit fails to switch power to the etch gun when in etch mode – the deposition gun continues to power up in etch, deposition, and LAS mode.

2.Specimen stage rotation sticks during long runs 3.Quartz crystal monitor contacts are flaky and fail during long runs or changes in stage tilt angle In addition, South Bay Technology, Inc. shall evaluate the instrument and perform tasks necessary to restore it to manufacturer performance specifications (see factory specification lists provided below). At a minimum South Bay Technology, Inc. shall:

•Vacuum test and certify that KDC10 ion sources are functioning properly to manufacturer specification external to IBSE system •Update Ion Source Connectors to most current design •Re‐install KDC10 ion sources and power supply. Pump down system and verify ion sources and ion source interface are working properly to manufacturer specifications Upon completion of the repairs, South Bay Technology, Inc. shall fully test the system at South Bay Technology, Inc. and provide a written summary, via email, to the current NIST instrument point of contact, (Frederick.Meisenkothen@nist.gov ), of all actions taken to include part numbers replaced or repaired and final system test results.

A 90 day warranty shall be provided on all parts and labor.

Performance Requirements •South Bay Technology, Inc. successfully completes the evaluation and repairs within the specified period of performance.

•South Bay Technology, Inc. successfully corrects the three known issues specified above (to be verified at NIST).

•South Bay Technology, Inc. successfully provides the written summary of all actions taken to include part numbers replaced or repaired and final system test results.

•Vacuum system performance and stage tilt/rotation performance meet factory specifications (to be verified at NIST).

•The ion sources power up and produce useful ion beams (to be verified at NIST).

The current NIST point of contact for the IBS/e-KDC-Dual instrument, Frederick Meisenkothen, will determine if these criteria have been met.

Kaufman Ion Source Controller Manufacturer Specifications (as per KSC 1202 Manual, Kaufman Ion Source Controller, 2011, Section 2 Specifications”, page 2-1)

•Cathode: 40 V, 30 A, less than 100Hz •Discharge: 100 V, 10 A •Beam: 1200 V, 200 mA •Accelerator: 600V, 200 mA •Neutralizer: 40 V, 25A, less than 100Hz DC Ion Source Manufacturer Specifications (KDC 10) (as per KDC 10 DC Ion Source Manual with 1 CM Two-Grid Graphite Optics, 2011, “Section 2.12 Ion Beam Specifications”, page 2-1) •useful argon ion-beam currents are generated from about 100 eV up to 1200 eV, discharge current of about 10 mA at 500 V (typical argon gas flow is 4 sccm).

Vacuum System Manufacturer Specifications (as per Model IBS/e-KDC-Dual Ion Beam Sputter Deposition and Etching System Instruction Manual, “Section 1.1 Specifications”, page 2) •Base pressure: 10-7 Torr •Operating Pressure: x10-5 Torr Independent Rotate and Tilt Stage Manufacturer Specifications (as per Model IBS/e-KDC-Dual Ion Beam Sputter Deposition and Etching System Instruction Manual, “Section 1.1 Specifications”, page 2) •Tilt Range, deposition mode: 0 to ±99° •Tilt Range, etch mode: 0 to ±99° •Tilt Range, with large area stage: 0 to ±17° •Specimen Stage: 2” diameter / 4” diameter optional •Tilt Angle Rate: variable •Rotational Speed: 3.5 to 30 RPM •Angular Adjustment: 10 steps