SATPC0034202 Tab 04 4 SOW.pdf
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- Solicitation number
- 80NSSC24861336Q
About this file
This notice summarizes a federal contract opportunity for the purchase of a di-water system. NASA's Advanced Lithography Lab in the Aerospace Communications Facility requires a di-water system capable of producing ultrapure water with a maximum resistivity of 18.2 MOcm, conductivity of 0.055 mS/cm, total organic carbon below 2 ppb, and no particle contamination larger than 0.22 microns. NASA intends to award this sole source contract to CRH Industrial Water LLC to supply and install this system at the Glenn Research Center in Ohio. Interested parties may submit qualifications by February 14, 2024 to argue for a competitive procurement instead, but the decision to make this award sole source is at the agency's discretion. The points of contact listed can provide additional details to interested offerors.
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SPECIFICATIONS or STATEMENT OF WORK (SOW)
The Advanced Lithography Lab in the ACF (Aerospace Communications Facility) requires an advanced DI (Di-ionized) water system for producing high quality PCBS (– Printed Circuit Boards).
This DI (Di-ionized) water system must produce water of quality listed below.
Ultrapure, water specifications
• Resistivity at 25 °C2 18.2 MΩ·cm
• Conductivity at 25 °C 0.055 μS/cm
• TOC ≤2 ppb (µg/L)3; typically ≤5 ppb
• Particles4 No particles with size >0.22 µm
• RNases7 <1 pg/mL
• DNases7 <5 pg/mL
• Proteases7 <0.15 µg/mL
• Flow rate Up to 2 L/min
• Bacteria5 <0.01 cfu/mL (<10 cfu/L)
• Pyrogens (endotoxins)6 <0.001 EU/mL
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