15-04135_SOW.pdf

Statement of Work (SOW)

SOLICITATION FOR A STYLUS PROFILOMETER

NB686020-15-04135

BACKGROUND INFORMATION

The National Institute of Standards & Technology (NIST) is issuing this solicitation for the purchase of a stylus profilometer to support nanofabrication in the Boulder Micro-fabrication Facility (BMF). The system will be sited and used in the BMF’s clean room on the NIST, Boulder site. The BMF presently operates an aging stylus profilometer what has reached its end of life and needs a replacement.

1. FOOTPRINT AND INSTALLATION:

a. The profilometer shall be a bench-top instrument.

b. The instrument shall be equipped with a means of vibration isolation integral to the frame such as to allow operation in a class 100 cleanroom.

c. The instrument shall be equipped with acoustical vibration isolation via an external cover or by mechanical design of the instrument to allow operation in a class 100 cleanroom.

2. STAGE:

a. The stage shall accommodate small pieces (≤ 5 mm square)

b. The stage shall accommodate 75 mm through 200 mm round Semiconductor Equipment and Materials

International (SEMI) standard wafers dimensions and thickness.

c. The stage shall provide for a manually or automatically actuated vacuum clamping mechanism and location pins.

d. The stage shall be capable of motorized translation along X and Y orthogonal axes, as well as +/-360 degree motorized rotation.

e. X-Y sample positioning via motorized and programmable 150 mm x 150 mm translation.

f. Stage motion during measurement shall allow for multiple repeated measurements in single X and multiple stepped Y dimensions.

g. Scan length: up to 200 mm with automatic scan stitching.

h. Vertical measurement range: up to 1 mm

i. The scan drive shall be capable of providing a baseline stability of ≤ 100 nm on a 50 mm scan.

3. MEASUREMENT HEAD:

a. Stylus vertical displacement shall be measured by a Linear Variable Differential Transformer.

b. Stylus force shall be capable of a range between 0.03 mg and 15 mg, controlled by software.

c. Vendor shall provide one stylus with system, of radius 2.5 +/- 0.5 micrometer.

d. Stylus exchange: the vendor shall demonstrate a quick and simple method of replacing the stylus within 1 minute during the on-site training session.

e. Shall provide visual location of measurement stylus with manual/fixed focus.

f. Shall allow sample thicknesses of up to 50 mm.

g. Step height repeatability: < 0.5 nm, 1 sigma on nominal 100 nm vertical step height standard.

h. Vertical resolution : ≤ 0.1 nm

i. Sensor shall allow for large vertical range (up to 1 mm) and low force (down to 0.03 mg) simultaneously.

4. OPTICS

a. The optics shall consist of a high definition color video microscope enabling the stylus to remain in view during the scan.

b. A digital zoom shall provide a field of view from 1 mm to 4 mm.

5. SOFTWARE

a. Windows 7 required.

b. High speed 64-bit parallel processor shall be preferred.

c. All data files must be exportable to Excel.

d. Software shall provide for automatic leveling of acquired data.

e. The instrument shall be capable of automated data collection of scans and maps at pre-programmed defined locations.

f. Mapping: the software shall enable an unlimited number of 2D or 3D map locations in a single recipe while displaying the map image in progress in real time.

g. The mapping patterns available shall include:

i. Rectangular/Cartesian maps

ii. Line scans

iii. User-defined patterns

6. DELIVERY and INSTALLATION: The delivery and installation of the system in the NIST, Boulder clean room shall be completed in less than 3 months ARO.

7. TRAINING

a. The vendor shall provide a 1-day training session at NIST site.

8. WARRANTY

a. The system shall have a warranty of one year for parts and labor starting on the date of acceptance at the customer site.

9. FINAL ACCEPTANCE

a. The vendor shall provide a system acceptance testing plan with the quotation.

10. OPTIONS

a. The vendor shall quote one additional vacuum chuck.

b. The vendor shall quote one vibration isolation table.