HF_Detector-SOW.docx

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HF Etcher HF Gas Dete4ctor Upgrade, Qualification & Trng
Solicitation number
N00174-18-R-0017
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Statement of Work

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FBO_Presolicitation_-_NOTICE_OF_INTENT_TO_SOLE_SOURCE.docx DOCX document

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Statement of Work For SPTS HF Vapor Etcher HF Gas Detector Upgrade, Qualification, and Training

1.0 Background

Naval Surface Warfare Center, Indian Head Explosive Ordnance Disposal Technology Division (NSWCIHEODTD), is currently obtaining micro electro mechanical systems (MEMS) fabrication capability on station. An SPTS HF vapor etcher has been purchased by NSWCIHEODTD for the SiO2 etch step of MEMS fabrication.

The current system internal HF gas leak detection system requires replacement. HF gas is toxic therefore the system is required to go to safe mode when a leak is detected preventing accidental exposure.

The system also requires qualification to ensure it is functioning within SPTS specified parameters and adjust as required. Once the machine is qualified, SPTS will provide training to NSWC users on machine use and maintenance.

2.0 Scope

Contractor shall provide, install, and test the HF gas leak detection system on-site. Contractor shall certify the system as fully operational at its optimal capability. SPTS shall provide training to NSWC system users regarding system utilization and maintenance.

3.0 Requirements

3a Material

The Contractor shall provide the following:

(1) Replacement HF gas leak detection system

(2) Documentation of machine qualification, showing machine performs within SPTS specification

3b. Service

The Contractor shall perform the following services:

a. Installation of replacement HF gas leak detection system

b. Testing the function of the HF gas leak detection system

c. Certify machine operation as fully operational and adjust as required to meet SPTS specifications

d. Provide training to NSWC users on utilization and maintenance

The Government shall provide the following for use by the contractor:

a. Access to optical profilometer

b. Isopropyl alcohol

c. Thermal oxide silicon wafers

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