15T0265_0001.pdf

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RIE PLASAM ETCH SYSTEM Federal contract opportunity
Solicitation number
N0016415T0265
Issued by
Department of the Navy Naval Sea Systems Command

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15T0265_0001

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AMENDMENT OF SOLICITATION/MODIFICATION OF CONTRACT

Except as provided herein, all terms and conditions of the document referenced in Item 9A or 10A, as heretofore changed, remains unchanged and in full force and effect.

15A. NAME AND TITLE OF SIGNER (Type or print)

30-105-04EXCEPTION TO SF 30

APPROVED BY OIRM 11-84

STANDARD FORM 30 (Rev. 10-83) Prescribed by GSA

FAR (48 CFR) 53.243

This solicitation is being amended to clarify the specifcations and reopen the solicitation.

During the course of the Government's evaluation of quotes recieved it w as apparent that the specification w as not adequate to verify all of the quotes for technical acceptance. This amendment replaces the specification in its entireity w ith the new clarified version. It also replaces the compliance martrix in CNIN-SAP-023 as w ell as extends the closing date to September 2, 2015 no later than 12:00PM. Quoters must return this amendment as w ell as all other requirements listed in CNIN-SAP-023.

All other terms and conditions remain the same.

1. CONTRACT ID CODE PAGE OF PAGES

J 1 8

16A. NAME AND TITLE OF CONTRACTING OFFICER (Type or print)

16C. DATE SIGNED

BY 24-Aug-2015

16B. UNITED STATES OF AMERICA15C. DATE SIGNED15B. CONTRACTOR/OFFEROR

(Signature of Contracting Officer)(Signature of person authorized to sign)

8. NAME AND ADDRESS OF CONTRACTOR (No., Street, County, State and Zip Code) X N00164-15-T-0265

X 9B. DATED (SEE ITEM 11)

24-Jul-2015

10B. DATED (SEE ITEM 13)

9A. AMENDMENT OF SOLICITATION NO.

11. THIS ITEM ONLY APPLIES TO AMENDMENTS OF SOLICITATIONS

X The above numbered solicitation is amended as set forth in Item 14. The hour and date specified for receipt of Offer X is extended, is not extended.

Offer must acknowledge receipt of this amendment prior to the hour and date specified in the solicitation or as amended by one of the following methods:

(a) By completing Items 8 and 15, and returning 1 copies of the amendment; (b) By acknowledging receipt of this amendment on each copy of the offer submitted;

or (c) By separate letter or telegram which includes a reference to the solicitation and amendment numbers. FAILURE OF YOUR ACKNOWLEDGMENT TO BE RECEIVED AT THE PLACE DESIGNATED FOR THE RECEIPT OF OFFERS PRIOR TO THE HOUR AND DATE SPECIFIED MAY RESULT IN

REJECTION OF YOUR OFFER. If by virtue of this amendment you desire to change an offer already submitted, such change may be made by telegram or letter, provided each telegram or letter makes reference to the solicitation and this amendment, and is received prior to the opening hour and date specified.

12. ACCOUNTING AND APPROPRIATION DATA (If required)

13. THIS ITEM APPLIES ONLY TO MODIFICATIONS OF CONTRACTS/ORDERS.

IT MODIFIES THE CONTRACT/ORDER NO. AS DESCRIBED IN ITEM 14.

A. THIS CHANGE ORDER IS ISSUED PURSUANT TO: (Specify authority) THE CHANGES SET FORTH IN ITEM 14 ARE MADE IN THE

CONTRACT ORDER NO. IN ITEM 10A.

B. THE ABOVE NUMBERED CONTRACT/ORDER IS MODIFIED TO REFLECT THE ADMINISTRATIVE CHANGES (such as changes in paying office, appropriation date, etc.) SET FORTH IN ITEM 14, PURSUANT TO THE AUTHORITY OF FAR 43.103(B).

C. THIS SUPPLEMENTAL AGREEMENT IS ENTERED INTO PURSUANT TO AUTHORITY OF:

D. OTHER (Specify type of modification and authority)

E. IMPORTANT: Contractor is not, is required to sign this document and return copies to the issuing office.

14. DESCRIPTION OF AMENDMENT/MODIFICATION (Organized by UCF section headings, including solicitation/contract subject matter where feasible.)

10A. MOD. OF CONTRACT/ORDER NO.

2. AMENDMENT/MODIFICATION NO. 5. PROJECT NO.(If applicable)

6. ISSUED BY

3. EFFECTIVE DATE

24-Aug-2015

CODE

NAVAL SURFACE WARFARE CENTER CRANE DIV

ANDREW B. FICKLIN

BLDG. 3373

300 HWY 361

CRANE IN 47522-5001

N00164 7. ADMINISTERED BY (If other than item 6)

4. REQUISITION/PURCHASE REQ. NO.

CODE

See Item 6

FACILITY CODECODE

EMAIL:TEL:

N00164-15-T-0265

SECTION SF 30 BLOCK 14 CONTINUATION PAGE

SECTION SF30 - SF 30 CONTINUATION SHEET

SUMMARY OF CHANGES

SECTION SAP - SAP CONTINUATION SHEET

The required response date/time has changed from 28-Jul-2015 02:00 PM to 02-Sep-2015 12:00 PM.

The following have been modified:

SPECIFICATIONS

SPECIFICATIONS

1.0 This document describes the required features and configuration for a benchtop Anisotropic Reactive Ion

Etch (RIE) Plasma Etch System. The system design and integrated process control shall be sufficient to enable repeatable anisotropic selective etching of nitride passivation and inter‐level dielectric (ILD) material layer(s) found on SOTA microelectronic components. The system will also be used for removal of polymer based encapsulant and passivation materials.

2.0 Salient Characteristics of the RIE Plasma Etch System.

a. RF Generator: Adjustable 0‐600 W (minimum) RF generator operating at 13.56MHz, with an automatic impedance matching network. The RF generator shall be air cooled and be capable of continuous use without overheating.

b. RF Electrode Configuration: The grounded (upper) and powered (lower) electrodes shall be circular parallel plates appropriately sized and optimized to establish a DC bias such that the generated plasma achieves a highly directional nature at the surface of the bottom electrode in order to ensure a high degree of anisotropy, permitting straight, vertical etching and inhibiting isotropic etching.

2.b.1 The lower electrode shall have a diameter of at least 6 inches.

2.b.2 The lower electrode shall be surrounded by a ceramic ring (or equivalent) that focuses and increases the plasma density between the upper and lower electrodes.

2.b.3 Separation between the upper and lower electrodes shall not exceed 2.0 inches 2.b.4 As a performance metric the system shall be able to etch silicon nitride passivation at a rate ≥ 1000Å/min.

c. Chamber: All process chamber materials shall be compatible with etch process gasses including pure oxygen as well as fluorinated gasses, e.g., CF4 and SF6. The process chamber volume shall be the minimum required to house the parallel electrodes, maximizing energy density and etch anisotropy and minimizing consumption of process gas. The maximum free volume of the process chamber shall not exceed 250 cubic inches.

d. Gas Control: Two mass flow controllers shall be provided to control the process gas flow at rates up to 250 sccm (standard cubic centimeter per minute). The system shall be capable of accommodating two additional mass flow controllers.

e. Vacuum Pump: The system shall consist of a 22 CFM (minimum) dry pump compatible with the process gas types mentioned above.

f. Cooling: The system shall include a Recirculating Cooling Unit.

g. Power: The system shall operate on 220V, 15 Amp (maximum), 1‐phase, 3‐wire, 50/60Hz.

h. Safety Enclosure: The system shall be equipped with an integrated safety enclosure with interlocked access door that protects operators from residual gas exposure during either a power outage or when the process chamber is opened during normal usage. The process chamber shall be fully contained within the safety enclosure and the safety enclosure door shall remain closed while the process chamber door opens.

i. Dimensions: The system shall be designed for benchtop use. Dimensions of the etch system shall not exceed 32”Wx36”Dx30”H (excluding vacuum pump and recirculating cooling unit).

j. Installation: Onsite installation by the manufacturer is required.

k. Warranty: A 12 month warranty shall be provided, covering all parts and labor costs required to maintain the system’s full functionality

SECTION SAP PROV - SAP PROVISIONS

The following have been modified:

THE FOLLOWING BEST VALUE DETERMINATION IAW FAR 13.106 LISTED WILL BE

USED TO EVALUATE THE QUOTES USING LOW PRICE TECHNICALLY

ACCEPTABLE EVALUATION CRITERIA:

QUOTERS – PLEASE SEE THE FOLLOWING FOR EVALUATION CRITERIA

The following Best Value Factors listed will be used to evaluate the Quotes using Low Price Technically Acceptable Evaluation Criteria – GO – NO GO Critiera:

TECHNICAL APPROACH

DELIVERY

PAST PERFORMANCE

CONSTRUCTIVE ACCEPTANCE

PRICE

Technical Acceptance Factor #1: Technical Approach Quoters will need to provide product literature or a capabilities document which outlines how the vendor will provide the system IAW the specification. See below compliance matrix which has a GO/NO GO section that will need filled out as part of technical acceptance. The product literature or capabilities document will be evaluated by the Requiring Technical Activity (RTA) in conjunction with the compliance matrix to ensure technical acceptance.

Technical Acceptance Factor #2: Delivery Quoters will need to fill out the clause 52.211-8 for evaluation by the Government. All vendors who can meet the Governments required delivery date will be deemed technically acceptable.

Technical Acceptance Factor #3: Past Performance Past performance will be evaluated based on the below questionnaire. The contractor will need to complete the questionnaire in its entirety and provide all information.

Projects listed will need to be work that had been completed by the contractor for same/similar supplies within the past three years and can be either Government or Commercial contractors.

Past performance will be based on GO / NO GO basis, evaluated strictly on the information provided on the questionnaire. An unacceptable (NO GO) equals the inability to have met any work listed on the questionnaire. A quoter with no past performance will be evaluated as neutral.

Technical Acceptance Factor #4: Constructive Acceptance Acceptance period is 15 days once the etching system is delivered and installed.

COMPLIANCE MATRIX

COMPLIANCE MATRIX

Interested parties must confirm the database meet the following specifications.

YES NO Exceeds specifications and explain how exceeds.

Specifications

a. RF Generator: Adjustable 0‐600 W (minimum) RF generator operating at 13.56MHz, with an automatic impedance matching network. The RF generator shall be air cooled and be capable of continuous use without overheating.

b. RF Electrode Configuration: The grounded (upper) and powered (lower) electrodes shall be circular parallel plates appropriately sized and optimized to establish a DC bias such that the generated plasma achieves a highly directional nature at the surface of the bottom electrode in order to ensure a high degree of anisotropy, permitting straight, vertical etching and inhibiting isotropic etching.

1.b.1 The lower electrode shall have a diameter of at least 6 inches.

1.b.2 The lower electrode shall be surrounded by a ceramic ring (or equivalent) that focuses and increases the plasma density between the upper and lower electrodes.

1.b.3 Separation between the upper and lower electrodes shall not exceed

2.0 inches

1.b.4 As a performance metric the system shall be able to etch silicon nitride passivation at a rate ≥ 1000Å/min.

c. Chamber: All process chamber materials shall be compatible with etch process gasses including pure oxygen as well as fluorinated gasses, e.g., CF4 and SF6.

The process chamber volume shall be the minimum required to house the parallel electrodes, maximizing energy density and etch anisotropy and minimizing consumption of process gas. The maximum free volume of the process chamber shall not exceed 250 cubic inches

d. Gas Control: Two mass flow controllers shall be provided to control the process gas flow at rates up to 250 sccm (standard cubic centimeter per minute). The system shall be capable of accommodating two additional mass flow controllers.

e. Vacuum Pump: The system shall consist of a 22 CFM (minimum) dry pump compatible with the process gas types mentioned above.

f. Cooling: The system shall include a Recirculating Cooling Unit.

g. Power: The system shall operate on 220V, 15 Amp (maximum), 1‐phase, 3‐wire, 50/60Hz.

h. Safety Enclosure: The system shall be equipped with an integrated safety enclosure with interlocked access door that protects operators from residual gas exposure during either a power outage or when the process chamber is opened during normal usage.

The process chamber shall be fully contained within the safety enclosure and the safety enclosure door shall remain closed while the process chamber door opens.

i. Dimensions: The system shall be designed for benchtop use. Dimensions of the etch system shall not exceed 32”Wx36”Dx30”H (excluding vacuum pump and recirculating cooling unit).

j. Installation: Onsite installation by the manufacturer is required.

k. Warranty: A 12 month warranty shall be provided, covering all parts and labor costs required to maintain the system’s full functionality

ORAL PRESENTATION:

The Government may request an oral presentation from all vendors who have quoted this solicitation, if the Government cannot properly discern all information provided.

The presentation can be conducted in two manners:

If an oral presentation is requested the vendor may travel at their own expense to NSWC Crane and present their quote.

If an oral presentation is requested the may set up a video conference in which to present their quote.

If an oral presentation is required the Government will amend the solicitation with precise instructions. This amendment will only be allowed for those who responded to the initial solicitation, no other vendors will be considered an interested party.

SEE TECHNICAL ACCEPTANCE EVALUATION MATRIX BELOW:

Quoter’s by checking a “GO” column you are certifying that your company meets technical acceptance evaluation factors. Matrix must be filled out for consideration of award.

TECHNICAL ACCEPTANCE

EVALUATION FACTOR

GO NO

GO

IF YOU CAN EXCEED ANY TECHNICAL ACCEPTANCE

EVALUATION CRITERIA PLEASE INDICATE HOW

BELOW

CONFORMANCE TO

SPECIFICATIONS

By checking GO in this box you are certifying you can provide the etching system required that meets all aspects outlined in the specifications removal.

CONFORMANCE TO DELIVERY

By checking GO in this box you are certifying that your company meets the Governments required delivery schedule outline in 52.211-8.

CONFORMANCE TO PAST

HISTORY

By checking GO in this box you are certifying that your company meets all of the requirements.

CONFORMANCE TO

CONSTRUCTIVE ACCPETANCE

By checking GO in this box you are certifying that your company agrees to the constructive acceptance of 15days.

A RESPONSIVE QUOTE CONSISTS OF THE FOLLOWING

Signed SF 1449 (ALL PAGES RETRURNED) 52.211-8 Time Of Delivery SF 1449 Delivery schedule filled out with Quoters delivery dates All pricing must be entered on each CLIN of solicitation.

Compliance Matrix completely filled out Technical Evaluation Matrix completely filled out Past Performance Questionnaire completely filled out Must be a small business manufacturer per the NAICS code or small business distributor (500 employees) representing a small business manufacturer.

ADDITIONAL DOCUMENTATION WILL BE ACCEPTED HOWEVER NO

QUOTER WILL BE CONSIDERED TECHNICALLY ACCEPTABLE WITHOUT

THE ABOVE MENTIONED DOCUMENTATION.

TO BE CONSIDERED TECHNICALLY ACCEPTABLE ALL QUOTERS MUST MEET

THE ABOVECRITERIA. ONCE QUOTERS HAVE BEEN DEEMED TECHNICALLY

ACCEPTABLE, THEN AND ONLY THEN WILL PRICE BE EVALUATED.

Quotes that are non-compliant with any material requirement of this solicitation may be rejected without further consideration for award. This will be a firm fixed price contract and will be awarded utilizing Simplified Acquisition Procedures.

ATTACHMENT I EXPERIENCE QUESTIONNAIRE

EXPERIENCE QUESTIONNAIRE

Instructions: Complete by inserting information or Xing box, as indicated. If extra space is needed to complete an item, use the remarks block (indicate item number in remarks block).

1. Contractor Name, Address, and Telephone Number DUNS Number:

CAGE Code:

2. Submitted to (Office Name & Address)

– Attn: Ashley Martin NSWC Crane RE: Solicitation #N00164-15-T-0265

3. Business Company ��Partnership �Corporation �Individual Non-profit Organization �

4. How many years do you or your firm have in the line of work contemplated by this solicitation? ________ Years

5. How many years experience in contracting have you or your business had as a (a) prime contractor ________ and/or (b) sub-contractor ______ for same/similar services.

6. List below the projects your business has completed within the last three years (continue on separate sheet if necessary):

Contract Amount

Type of Project

Date Completed Name, Address, and Telephone No. of Owner/Person to Contract for Project Information

7. List below all of your firm’s contractual commitments running concurrently with the work contemplated by this solicitation (continue on separate sheet if necessary):

Contract Amount

Dollar Amt Of Award

Name, Address, and Telephone No. of Business/Government Agency Involved

Awarded (Units)

Percent Completed

Date Contract

Completed

8a. Have you ever failed to complete any work awarded to you? _____ Yes _____ No 8b. Has work ever been completed by performance bond? _____ Yes _____ No 8c. If “Yes” to either item 8a or 8b specify location(s) and reason(s) why (continue on separate sheet if necessary):

CERTIFICATION

I certify that all of the statements made by me are complete and correct to the best of my knowledge and that any persons named as references are authorized to furnish NSWC Crane with any information needed to verify my capability to perform this project.

9a.Certifying Official’s Name and Title

9b. Signature (Sign in Ink) 10. Date

(End of Summary of Changes)

File details come from the government source that posted it. Updated .