GDMS Specification.docx

Statement of Work For a Glow Discharge Magnetic Sector Mass Spectrometer (GDMS)

1.0 Background

To facilitate elemental analysis and depth profiling of metals, alloys, coatings, and pressed powders, the Government requires a Glow Discharge Magnetic Sector Mass Spectrometer (GDMS).

2.0 Purpose

2.1 This Statement of Work is to define the requirements and deliverables to be used in the selection and procurement of a GDMS system to be delivered to DEVCOM AC WSEC Benét Laboratories (Bldg. 115).

3.0 Requirements

3.1 The contractor shall provide GDMS system with the following required minimum specifications:

0. The system shall be comprised of a glow discharge source, a dual-sector electric magnetic (EB) mass analyzer, and detectors.

0. The system shall have variable resolution of up to 10,000 or better.

0. The system shall have a mass range >300 amu.

0. The system shall have magnetic field control using a Hall Probe or similar control element.

0. The system shall have a method for resolution tuning and selection, including 2 hexapole lenses and a variable collector slit, or similar components.

0. The system shall have the capability of mounting three detectors simultaneously.

0. The system shall be provided with multiple detectors, comprised of at least one Faraday cup and one electron multiplier tube, to facilitate linear dynamic range over 12 orders of magnitude or more, ranging from sub-ppb to weight percent quantitation.

0. The system shall have a mass accuracy of 100 ppm or better.

0. The system shall be capable of measuring elements from hydrogen to uranium.

0. The system shall be capable of analyzing both conductive and non-conductive samples.

1. The glow discharge source shall be capable of generating a plasma in both direct current (DC) and radio frequency (RF) modes, and mode selection shall be fully automatic.

1. RF plasma generation shall allow for the analysis of non-conductive samples without the use of a conductive binder.

1. The system shall support the analysis of curved (via a conductive or non-conductive binder), flat, pin, and powder samples.

0. The system shall support depth profiling analysis of samples.

2. The system shall be capable of sputtering at rates of 150 nm/min or lower for conductive samples, and 100 nm/min or lower for non-conductive samples.

2. The system shall optimize current and voltage for sputtering to create flat-bottomed craters to maintain uniform depth profiling data.

2. The system shall include a magnet capable of rapidly field adjustment to facilitate depth profile analysis of multiple elements simultaneously with high depth resolution.

0. The system shall support cryo-cooling of the GD cell to minimize gas backgrounds and support low-weight elemental depth profiling, including hydrogen.

0. The system shall include any required vacuum pumps, chillers, or other ancillary equipment required for operation.

0. The system shall include a workstation with all required hardware, software, and licenses.

5. The workstation shall include all required components for operation of the system, including but not limited to computer, monitor, and peripherals.

5. Software shall be capable of full instrument control, data analysis, and data archiving. Software in combination with the workstation shall allow for complete stand-alone system operation.

1. Instrument control software shall provide complete control over all data acquisition parameters, including automatic acquisition, plasma parameters, mass calibration, instrument monitoring, data export functions, and instrument startup/shutdown.

1. Software shall allow for the determination of potential interferences at given m/z values.

1. Software shall allow for quantitation of all elements measured, in both bulk and depth profiling.

1. Software shall be capable of mapping elemental composition as a function of true depth, given external crater depth measurement data.

5. Software licenses shall be provided for instrument control and any required analysis modules.

4.0 Installation

4.1 On-site installation shall be performed by the manufacturer at AC DEVCOM-Benét Laboratories located at Watervliet Arsenal, NY, 12189.

5.0 Training

5.1 The contractor shall provide system startup and familiarization for at least three Benét employees on all modes of operation and any required instrument maintenance.

6.0 Warranty

6.1 The Contractor shall offer a standard commercial warranty, including service warranty on labor, parts, and materials for all system and workstation components for a minimum period of one (1) year from the date of installation.

7.0 Written Deliverable

7.1 The Contractor shall provide written certification that the installed instrument meets the quoted specifications IAW DI-MISC-81356A.

8.0 General Requirements and Information

8.1 The period of performance of the contract shall commence upon award of the contract and shall be completed upon delivery of the system, which shall occur within 6 months from award of the contract.

8.2 The instrument shall be delivered to: