SOW_for_Wet_Bench.docx

STATEMENT OF WORK FORMAT

Wet Chemical Processing Bench

PCN:

Background The GSFC Detector Development Laboratory (DDL) has a requirement to procure a laboratory bench for wafer processing with wet chemicals. The system is used to clean and prepare wafers up to 200 mm in diameter, in the fabrication of detector arrays, components or similar devices. The system should be suitable a variety of wafer sizes, specifically including 100mm, 150mm and 200mm wafers. The system shall include all necessary equipment and hardware to enable semi-automatic operation in addition to, as needed, heating or ultrasonic agitation of the chemicals. The vendor shall provide technical support of the equipment.

Objectives The objective of this project is to procure a clean room compatible, laboratory style bench, capable of supporting a minimum of 4 different chemistries for cleaning of silicon wafers up to 200mm in diameter.

Scope The scope of this work includes production and delivery of a chemical bench containing tanks for prcessing silicon wafers. These tanks must be sized to fit cassettes for wafers sizes up to 200mm and also allow for Manuela use with single wafer wands. The bench must be cleanroom compatible and as well as compatible with the chemistries specified below. The bench must include semi-automatic robot control that will move cassettes from a process tank into a DI water rinse tank. This tool will enable an increased yield as well as production of large focal plane devices, in addition to new capabilities for improved performance of products manufactured in the DDL. With our existing wet benches, we can only safely accommodate 150 mm wafers and the system is prone to particles and cross contamination. The procurement of this tool is essential for many projects under development and in production in GSFC’s Detector System Branch. In particular, the equipment is needed to enable internal R&D projects and realize future missions such as next generation Microshutters, WFIRST, ATHENA and next gen TIRS, which are important to Goddard’s lines of business.

No prototypes or one-of-a-kind systems will be considered. The unit must be a production model with at least 5 similar units working in the field. The following milestones are expected.

a) Design of the Tool at the vendor location.

b) Approval of the design by the GSFC technical representative, communicating requirements to GSFC for installation including electrical power needs, and other utilities as required.

c) Construction of the Tool at the vendor facility.

d) Crating and Shipping of the unit to GSFC.

e) Installing, demonstrating, and training, of approximately three GSFC personnel, on all functions of the Tool at GSFC.

f) Acceptance testing of the Tool at NASA.

Tasks or Requirements The Supplier shall provide a new Wet Bench. The Supplier shall insure that the Tool is equipped with the following equipment and meet the following requirements prior to Acceptance of System:

Furnace System Tool Requirements

1. A brand new unit is required; no used equipment or accessories are acceptable.

2. The cover letter shall include a description of the vendor’s current user base, listing the number of similar tools in the field. A list of references is preferred.

3. Production scale model preferred. Unproven equipment will not be accepted, no first design models or development models will be accepted. Customer may request up to 3 references of a similar tool being utilized in the field prior to selection.

4. Meets current industry standard (semi S2) requirements for safety including the use of Emergency Off (EMO) panic buttons. Shielding, and interlocks for hazardous areas protecting the user and maintenance personnel from high voltages, pneumatics, and moving parts and the tool from potential service failures shall be provided.

5. Tool Requirements

5.1. Semi-automatic Robotic Control

5.1.1. The unit shall include a robot assisted wafer cassette transfer between each process tank and corresponding quick dump rinse tank.

5.1.2. Robot end effector and process tanks shall be designed to process a single cassette of 100mm, 150mm or 200mm wafers.

5.1.3. A rotating stepper motorized transfer arm shall be used to move a cassette between front and rear processing tanks. The stepper motor and process tanks shall be controlled by a PLC-based Master Controller using a touchscreen display.

5.1.4. The transfer mechanism shall be versatile and programmable, where various parameters may be selected and then stored in a recipe identified by an alphanumeric name.

5.1.5. Stepper motor robot shall be provided for each process tank. Quantity 4 stepper motors shall be provided.)

5.1.6. The stepper motor shall be robust, almost inaudible device which sealed in an N2 purged enclosure on the deck top, adjacent to the process tanks.

5.1.7. Robot, mechanical connectors and tray materials shall be compatible with process chemicals.

5.1.8. Motor exterior housing shall be N2 purged

5.2. Frame

5.2.1. The material of construction shall be FM Global listed PVC-C

5.2.2. Deck shall consist of specified tanks and cutouts needed for facilities (DI, N2).

5.2.3. Each work area shall have swinging and lockable face shields

5.2.4. Two (2) top exhaust ports 8” in diameter shall be included.

5.2.5. The upper head case containing electrical and pneumatic components shall be N2 purged.

5.2.6. Above the deck, the open area shall be clear with enough space to comfortably and safely transfer wafer cassettes up to 200 mm from process chemical to rinse tank manually, in the event that a robot is not functioning.

5.2.7. LED lighting shall be provided within the work area

5.2.8. EMO controller with indicator lights and push to lock/twist to release EPO red mushroom switch shall be provided.

5.2.9. Two (2) sets of N2 and DI guns shall be provided.

5.2.10. The upper head case shall include one pair of 3 prong electrical outlets for 120 volts supply.

5.2.11. The bench shall include exhausted storage for a minimum of 8 individual gallon size chemical bottles.

5.3. Controllers

5.3.1. For each process tank, a touchscreen PLC based controller shall be provided mounted in the head casing.

5.3.2. Each controller shall include a configurable process timer, temperature setting, drain control and other features that control the robot arm, cycle, count, speed.

5.3.3. The controllers shall include audible alarm buzzers.

5.3.4. The controllers shall include chemically resistant touchscreens.

5.4. Process Tank 1

5.4.1. This tank shall be a static bath with heater for temperature control.

5.4.2. Heater control shall be through PLC controller and be of sufficient rating to heat control the bath to a set point between 60 and 100C and do so in a reasonable amount of time.

5.4.3. Shall include one process chemical tank in the rear of the deck made of PVDF.

5.4.4. Use of PTFE Teflon 2 way pneumatic actuator valves shall be employed.

5.4.5. PFA Teflon tubing and fittings shall be used.

5.4.6. Manual Lids shall be provided to cover process tanks after processing.

5.4.7. At each process station there shall be provided convenient storage of the lid during processing.

5.4.8. Spacer blocks shall be provided to minimize chemical volume needed to process 100mm and 150mm wafer cassettes.

5.4.9. This tank and associated rinse tank, robot stepper motor and all associated hardware, valves and electronics shall be controlled by a PLC controller mounted to head case in front and be clearly associated with this process tank.

5.4.10. The internal dimensions of the tank shall be at a minimum, 12” x 12” x 12”.

5.4.11. Shall be compatible with H2SO4 and H2O2.

5.4.12. Shall incorporate a N2 back pressure switch liquid level sensors

5.5. Process Tank 2

5.5.1. This tank shall be a static bath at ambient temperature.

5.5.2. Shall include one process chemical tank in the rear of the deck made of PVDF.

5.5.3. Use of PTFE Teflon 2 way pneumatic actuator valves shall be employed.

5.5.4. PFA Teflon tubing and fittings shall be used.

5.5.5. Manual Lids shall be provided to cover process tanks after processing.

5.5.6. At each process station there shall be provided convenient storage of the lid during processing.

5.5.7. Spacer blocks shall be provided to minimize chemical volume needed to process 100mm and 150mm wafer cassettes.

5.5.8. This tank and associated rinse tank, robot stepper motor and all associated hardware, valves and electronics shall be controlled by a PLC controller mounted to head case in front and be clearly associated with this process tank.

5.5.9. The internal dimensions of the tank shall be at a minimum, 12” x 12” x 12”.

5.5.10. Shall be compatible with dilute HF.

5.5.11. Shall incorporate a N2 back pressure switch liquid level sensors

5.6. Process Tank 3

5.6.1. This tank shall be a static bath with heater for temperature control and Megasonic agitation.

5.6.2. Heater control shall be through PLC controller and be of sufficient rating to heat control the bath to a set point between 60 and 100C and do so in a reasonable amount of time.

5.6.3. The Megasonic plate and generator shall be capable of 950 kHz at 500 Watts and shall be controlled by the tank PLC controller.

5.6.4. The Megasonic plate shall be PFA coated and fixed to the bottom of the process tank.

5.6.5. Shall include one process chemical tank in the rear of the deck made of PVDF.

5.6.6. Use of PTFE Teflon 2 way pneumatic actuator valves shall be employed.

5.6.7. PFA Teflon tubing and fittings shall be used.

5.6.8. Manual Lids shall be provided to cover process tanks after processing.

5.6.9. At each process station there shall be provided convenient storage of the lid during processing.

5.6.10. Spacer blocks shall be provided to minimize chemical volume needed to process 100mm and 150mm wafer cassettes.

5.6.11. This tank and associated rinse tank, robot stepper motor and all associated hardware, valves and electronics shall be controlled by a PLC controller mounted to head case in front and be clearly associated with this process tank.

5.6.12. The internal dimensions of the tank shall be at a minimum, 12” x 12” x 12”.

5.6.13. Shall be compatible with NH4OH and H2O2.

5.6.14. Shall incorporate a N2 back pressure switch liquid level sensors

5.7. Process Tank 4

5.7.1. This tank shall be a static bath with heater for temperature control.

5.7.2. Heater control shall be through PLC controller and be of sufficient rating to heat control the bath to a set point between 60 and 100C and do so in a reasonable amount of time.

5.7.3. Shall include one process chemical tank in the rear of the deck made of PVDF.

5.7.4. Use of PTFE Teflon 2 way pneumatic actuator valves shall be employed.

5.7.5. PFA Teflon tubing and fittings shall be used.

5.7.6. Manual Lids shall be provided to cover process tanks after processing.

5.7.7. At each process station there shall be provided convenient storage of the lid during processing.

5.7.8. Spacer blocks shall be provided to minimize chemical volume needed to process 100mm and 150mm wafer cassettes.

5.7.9. This tank and associated rinse tank, robot stepper motor and all associated hardware, valves and electronics shall be controlled by a PLC controller mounted to head case in front and be clearly associated with this process tank.

5.7.10. The internal dimensions of the tank shall be at a minimum, 12” x 12” x 12”.

5.7.11. Shall be compatible with HCl and H2O2.

5.7.12. Shall incorporate a N2 back pressure switch liquid level sensors

5.8. Quick Dump Rinse Tanks (Quantity x4)

5.8.1. Positioned in front of each Process Tank there shall be a quick dump rinse tank.

5.8.2. Each Rinse Tank shall be made of polypropylene construction.

5.8.3. Each Rinse Tank shall incorporate a 4-sided overflow. Using manifold and all needle valves for controlling DIW supply rate.

5.8.4. Each Rinse Tank shall feature a quick dump drain valve, a gravity drain to the plenum.

5.8.5. Use of PTFE Teflon 2 way pneumatic actuator valves shall be employed.

5.8.6. PFA Teflon tubing and fittings shall be used.

5.8.7. Manual side mount Lid shall be provided to cover tank.

5.8.8. Optimized to accommodate 1 cassette of 200mm wafers or smaller.

5.8.9. Spacer blocks shall be provided to minimize chemical volume needed to process 100mm and 150mm wafer cassettes.

5.8.10. Each Rinse Tank, robot stepper motor and all associated hardware, valves and electronics shall be controlled by a PLC controller mounted to head case in front and be clearly associated with this process tank.

5.8.11. The internal dimensions of the tank shall shall be at a minimum, 12” x 12” x 12”.

5.8.12. Top spray bars and bottom fill shall be used.

5.9. Drains and Carboys

5.9.1. Each Rinse Tank shall drain either through the plenum or directly to a main drain line.

5.9.2. Each process tank shall have an associated carboy stowed in the space under the deck that can accommodate 10 gallons of liquid.

5.9.3. Each process tank shall have a diverter valve that directs the waste either to its associated carboy or sends it directly to the main drain.

5.9.4. The diverter valve position shall be controllable in the PLC located at each process station.

5.9.5. Each carboy shall have a liquid level sensor external and separate from the carboy. The level sensor, when activated shall close the diverter to prevent the carboy from overflowing.

5.9.6. Carboys shall be accessible from the front of the bench.

5.9.7. Carboys shall be double wall contained polypropylene.

5.9.8. Complete carboy unit shall be a wheeled unit, complete with an on-board pneumatic pump for safe and easy delivery to transfer point.

6. Space Requirements.

6.1. The tool must fit within our space requirements. This requirement will be used as selection criteria. The tool foot print must fit with in a 8’ length, 42” depth and 8’ height (up to the exhaust connection).

7. Final Acceptance

7.1. Successful installation is required that includes the following.

7.1.1. Demonstration of the tool in the planned site.

7.1.2. Demonstration of heater control.

7.1.3. Demonstration of megasonic operation.

7.1.4. Demonstration of diverter valves.

7.1.5. Demonstration of all robot stepper motors.

7.1.5.1. Repeated actuation of all robot motors cycled a minimum of 10 times.

8. PLC Interface

8.1. The Tool shall include PLC controller interface for each process/rinse tank combination. The interface shall run Windows 10 operating system or current Linux based OS.

8.2. The Tool interface shall allow access to recipe creation and editing, display current conditions of heaters and megasonics as is appropriate.

8.3. The software shall handle storage of at least 10 user recipes.

8.4. The PLC interface shall incorporate alarm or error handling for maintenance and troubleshooting.

9. Facilities

9.1. The Tool and all required facilities shall be specified at the time of award and GSFC shall be notified of these requirements.

9.2. Exterior surface parts shall be clean and free of grease or dust and compatible with operation in a Class 100 cleanroom environment.

10. Installation and Training

10.1. The price of the system will include installation at GSFC. Installation will include a demonstration that the tool is within compliance with the specifications.

10.2. The price of the system must include all crating and delivery of the tool to Goddard Space Flight Center.

10.3. At the completion of installation and demonstration of final acceptance, the successful contractor will provide on-location training at GSFC.

10.4. The Supplier shall install the system on-site at GSFC’s Detector Development Laboratory or another, designated, laboratory in Code 553 control and provide operator training of the system. Together with GSFC technical personnel, the Supplier shall review the system, demonstrate and confirm that the system functions properly based on the specifications above.

10.5. Installation and training shall be performed by a factory trained technician at NASA/GSFC.

11. Documentation and Warranty

11.1. Two (x2) full sets of all written documentation shall be provided on cleanroom paper. This shall include user manuals or equivalent as well as copies of any software, and any manuals for the software included with the system, and third party manuals. This documentation should be received by GSFC with the system hardware.

11.2. The contractor will offer the GSFC at least the same warranty terms, including offers of extended warranties, offered to the general public in customary commercial practice. Warranty terms must be included in the system price.

11.3. The period of warranty will begin upon acceptance of the system.

11.4. Supplier shall provide a Warranty of at least 12 Months (Parts and Labor), guaranteed to meet factory specifications.

11.5. Vendor ability to provide fast service and maintenance, preferably from a local site, as needed shall be considered.

12. Deliverables or Delivery Schedule Deliver complete specified (as described above) system. Set up and install all components at GSFC Detector Development Laboratory. The technical merit of the Suppliers’ proposal will be evaluated in terms of by how much they exceed the technical specifications listed in this statement of work.

1. Demonstrate system with specified performance/acceptance criteria (described above). Acceptance of system will be conditional upon successful demonstration of functions.

1. Provide user training for equipment operation.

1. Equipment warranty on parts and labor for at least one year.

1. Operational manuals and maintenance manuals with circuit schematics and layouts.

1. Spare parts.

Delivery Schedule Within 22 weeks after receipt of order.

Government-Furnished Equipment and Government-Furnished Information No Government-furnished equipment (GPE) and Government-furnished information (GFI) will be required

Security The Supplier Representative who will be installing the Furnace and Training NASA personnel must be a US Citizen.

Place of Performance The Construction of the Tool shall be performed at the Supplier’s facilities.

The Installation and Training shall be performed at NASA/GSFC, Greenbelt, Maryland.