1333ND26QNB030476.pdf

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Silicon and Silicon/Germanium Epitaxial Wafers
Solicitation number
1333ND26QNB030476
Issued by

About this file

This is a Request for Quotations (RFQ) for the procurement of silicon and silicon/germanium epitaxial wafers for research and metrology purposes at the National Institute of Standards and Technology (NIST).

The solicitation seeks firm-fixed price quotations for twelve line items encompassing oxide or nitride deposition, additional metrology services, and epitaxial SiGe deposition on silicon wafers. Line items 0001, 0003, 0005, 0007, 0009, and 0011 each require 10 wafers (300 mm or at least 15 wafers at 200 mm), with associated metrology measurements provided in line items 0002, 0004, 0006, 0008, 0010, and 0012. All deliverables must be delivered to NIST in Gaithersburg, Maryland, with initial deliveries required within 90 to 270 days of order receipt depending on the line item. Technical specifications require specific film thicknesses, deposition methods (atomic layer deposition or equivalent), X-ray characterization at five measurement points per wafer, and optical characterization mapping with greater than 80 points per wafer. Award will be made to the responsible quoter offering the lowest price for a technically acceptable quotation. The solicitation is set aside for small businesses and is classified under NAICS code 334413 (Semiconductor and Related Device Manufacturing). Quoters must provide active System for Award Management (SAM) registrations, indicate product manufacturer location (domestic or foreign), and submit completed copies of all required solicitation provisions. Payment will be made electronically through the Invoice Processing Platform (IPP) upon delivery and acceptance of conforming wafers at the designated NIST facility.

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BUSINESS

ELIGIBLE UNDER THE WOMEN-OWNED

BUSINESS PROGRAM

1333ND26QNB030476

Attachment Page

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SCHEDULE Continued

ITEM NO. SUPPLIES/SERVICES QUANTITY UNIT UNIT PRICE AMOUNT

0001 Oxide or Nitride deposition #1 10.00 EA

OPT

0002 Additional Metrology for Line Item 0001

Period of Performance: 04/01/2026 to 04/01/2027

1.00 EA

OPT

0003 oxide or nitride deposition #2

Period of Performance: 04/01/2026 to 04/01/2027

10.00 EA

OPT

0004 Additional Metrology for Line Item 0003

Period of Performance: 04/01/2026 to 04/01/2027

1.00 EA

0005 oxide or nitride deposition #3 (with AU cap) 10.00 EA

OPT

0006 Additional Metrology for Line Item 0005

Period of Performance: 04/01/2026 to 04/01/2027

1.00 EA

OPT

0007 epitaxial SiGe deposition #1

Period of Performance: 04/01/2026 to 04/01/2027

10.00 EA

OPT

0008 Additional Metrology for Line Item 0007

Period of Performance: 04/01/2026 to 04/01/2027

1.00 EA

0009 epitaxial SiGe deposition #2 10.00 EA

OPT

0010 Additional Metrology for Line Item 0009

Period of Performance: 04/01/2026 to 04/01/2027

1.00 EA

OPT

0011 epitaxial SiGe deposition #3 (with Au or equiv. cap)

Period of Performance: 04/01/2026 to 04/01/2027

10.00 EA

OPT

0012 Additional Metrology for Line Item 0011

Period of Performance: 04/01/2026 to 04/01/2027

1.00 EA

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Table of Contents

Requirement

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CLAUSES

Requirement

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Clauses

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