Accurate SEM-based overlay and other documentary standards could emerge from this effort

Active Project Grant Awarded Last action

Award ID
60NANB26D004
Recipient
Awarding agency
Obligated
$35,000

Award facts

Assistance listing
11.609 Measurement and Engineering Research and Standards
Completion date 34% complete
Place of performance
Schenectady, NY 12303, USA

Award details come from USAspending.gov.

Description

As the agency reported it.

Activities
1. Add overlay structure automatically with an additional overlay GUI in which the user would provide the dimensions, choose the overlay structure and the structure would be created. 2. Additional features to perform design of experiments for geometric features. IT would be efficient to be able to have the simulation vary location and / or dimensions of features in the overlay patterns and/the thickness of the different layers to accomplish the overlay project goals. 3. Additional features of the electron beam, especially the beam direction and the asymmetry of the beam cross section. 4. More flexibility with defining the electron gun and the ability to loop over a range of beam directions. The software currently has the ability to loop over some important parameters, such as beam size. 5. Add additional materials to the simusem materials database, especially oxides. 6. Add fractional factorial design capability so that few experiments are needed to obtain the desired analysis. 7. Add roughness to the surface of the overlay structures 8. Allow design of experiments with geometric parameters, including adding some random variability 9. Optimizing distributed computing for the NIST computer cluster expected outcomes: advancing U.S. Leadership in documentary standards development to strengthen U.S. Global competitiveness in advanced microelectronics materials, design, manufacturing, and packaging. Accurate SEM-based overlay and other documentary standards could emerge from this effort. Computational SEM imaging and metrology will help any field of technology and science where sems are used. Developing and deploying critically needed measurement services (reference materials, reference data, calibrations) to drive U.S. Leadership in microelectronics manufacturing and related technologies. The innovative SEM overlay metrology developed by this project will allow the design of SEM and optical overlay metrology wafers as standard reference materials useful for the IC industry. Developing and deploying innovative manufacturing metrologies to enable the U.S. Industry to increase manufacturing yield, improve performance, and accelerate time to market for next-generation microelectronics. Because the computational SEM overlay measurement capabilities are based on the physics of signal generation and detection, they will apply to any SEM-based imaging and measurement, especially in the optimization and development of future IC structures, materials, and measurands and to the sems themselves by identifying the best, optimized ways of generating and detecting SEM signals that carry the information sought.
Intended beneficiaries
Computational SEM imaging and metrology will help any field of technology and science where sems are used. This project will also be beneficial for the IC industry.
Subrecipient activities
The recipient does not intend to subaward funds.

Quick answers

Who received award 60NANB26D004?

60NANB26D004 was awarded to Amag Consulting, LLC by National Institute of Standards and Technology (Department of Commerce) on March 1, 2026.

How much is award 60NANB26D004 worth?

$35,000 has been obligated on 60NANB26D004.

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