Sbir phase I: microscale selective sintering for high throughput metal additive manufacturing of interconnects in semiconductor packaging

Ended Project Grant Awarded Last action

Award ID
2507416
Recipient
Awarding agency
Obligated
$305,000

Award facts

Completion date
Place of performance
Austin, TX 78751, USA

Award details come from USAspending.gov.

About this award

Texas Microsintering LLC received a $305,000 Phase I Small Business Innovation Research (SBIR) award from the National Science Foundation's Directorate for Technology, Innovation, and Partnerships (CFDA 47.084) effective October 1, 2025, through September 30, 2026. The project focuses on developing microscale selective laser sintering (μ-SLS), an advanced 3D printing technology designed to manufacture custom metal interconnect structures for semiconductor packaging. This additive manufacturing process uses a digital micromirror device to pattern laser energy and fuse metal nanoparticles into three-dimensional interconnects directly from digital specifications, eliminating the need for expensive custom tooling and lithography processes.

The primary deliverable is a viable, cost-effective additive manufacturing process for low-volume, high-mix semiconductor applications that reduces production timelines and costs for specialized chip interconnects. The technology addresses critical market needs in defense electronics, medical devices, and scientific research by enabling rapid prototyping and development of custom semiconductor components. The awardee's business strategy centers on licensing the proprietary technology to equipment manufacturers to ensure broad market adoption, leveraging the process's unique combination of speed, precision, and flexibility to establish competitive advantage while strengthening domestic semiconductor manufacturing capabilities.

Description

Abstract
The broader/commercial impact of this SBIR phase I project is the commercialization of microscale selective laser sintering (?-SLS), a new 3D printing technology that drastically lowers the cost and time required to produce custom interconnect structures for semiconductor chips. Currently, the high cost of creating specialized chip interconnects limits innovation in critical fields such as national defense, medical devices, and scientific research. This project introduces an advanced 3D printing process that builds microscopic metal connections on chips directly from a digital file, eliminating the need for expensive custom tooling. This innovation significantly reduces the financial barrier for producing small batches of high-performance chips, enabling faster prototyping and development. The initial market will be defense electronics, followed by expansion into other specialized sectors. The business model involves licensing this proprietary technology to equipment manufacturers, ensuring widespread adoption and a durable competitive advantage based on a unique combination of speed, precision, and flexibility. By strengthening domestic manufacturing capabilities and enabling new technologies, this project serves the national interest by advancing national security, economic prosperity, and scientific progress. This small business innovation research (SBIR) phase I project addresses the technical challenges of creating a viable additive manufacturing process for semiconductor packaging. IT provides a cost-effective alternative to traditional lithography for the low-volume, high-mix production required by custom semiconductor applications. This project investigates microscale selective laser sintering (?-SLS), a novel process which uses a digital micromirror device to pattern laser energy and fuse metal nanoparticles into 3D interconnect structures. The main research objective is to transition this process from glass substrates to industry-standard silicon wafers. Key research activities include updating thermal and coating models, fabricating multi-layer copper test structures, and characterizing their properties. Anticipated results include a validated process for producing copper interconnects on silicon with sufficient mechanical adhesion (>5 MPA) and electrical conductivity (>50% of bulk copper). This work will also establish the limits of key material properties, such as the coefficient of thermal expansion, young's modulus, and shear strength, which are critical for thermomechanical reliability of the fabricated electronic package. These results will define the operational limits for future device design and demonstrate the technology's commercial potential. This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the foundation's intellectual merit and broader impacts review criteria.- subawards are not planned for this award.

Quick answers

Who received award 2507416?

2507416 was awarded to Texas Microsintering LLC by National Science Foundation on October 1, 2025.

How much is award 2507416 worth?

$305,000 has been obligated on 2507416.

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