Etste DCL: pathways leading to advanced semiconductor manufacturing across new york (plasma-NY)

This $649,953 Project Grant awarded by the National Science Foundation (NSF) under the STEM Education (CFDA 47.076) program aims to develop multiple educational pathways leading to careers in the semiconductor manufacturing industry in the five-county Central New York region. The project, titled "Pathways Leading to Advanced Semiconductor Manufacturing Across New York (PLASMA-NY)", seeks to integrate semiconductor-focused competencies, learning outcomes, course content, and labs into an industry-recognized micro-credential program. The project also plans to create additional on- and off-ramps to degree and certificate programs in the semiconductor industry, providing individuals with prior technical or engineering experience increased access to specialized training and well-paid jobs. Collaborations with high schools and other two-year colleges are expected to expand upon this project to offer concurrent enrollment pathways and co-delivery options. The overall goal is to create industry-validated, semiconductor-focused content that can be integrated as a stackable credential within associate degree programs. No sub-awards are planned for this award.

Abstract

This track 2 ATE project aims to develop multiple educational pathways leading to careers in the semiconductor manufacturing industry in the five-county central new york region. Project activities seek to make a significant contribution to statewide and national efforts to strengthen the U.S. Semiconductor ecosystem. Building upon existing electromechanical technology and engineering science associate degree programs, this project plans to integrate semiconductor competencies, learning outcomes, course content and labs into an industry recognized micro-credential. Additional on- and off-ramps to degree and certificates in the semiconductor industry are also part of the development plan. These new pathways intend to provide individuals with prior technical engineering experience increased access to specialized training and ultimately to well-paid jobs. Collaborations with high schools and other two-year colleges are likely to expand upon this project to provide concurrent enrollment pathways and CO-delivery options. Ultimately, the results should provide numerous opportunities for students to develop the specialized knowledge and skills needed to obtain employment in a rapidly expanding industry. The overall goal of this project is to create multiple educational pathways for individuals to earn industry-validated credentials that provide the critical skills and knowledge needed to enter and advance in technician and engineering positions in the semiconductor industry. This project seeks to incorporate the evidence-based business industry leadership team (bilt) model and developing a curriculum (dacum) process to systematically engage employers and expert educators to validate new curriculum, resulting in alignment of the skills needed with the needs of industry. Ultimately, this project aims to result in industry-validated, semiconductor-focused content that can be integrated as a stackable credential within an associate of applied science and associate of science degree. Collaborations with high school partners and baccalaureate degree institutions will provide additional pathways for expanding access to these new technical education opportunities in the semiconductor field. Project evaluation aims to generate findings to support formative feedback to improve execution of proposed activities as well as contribute to the knowledge of effective semiconductor training programs. This project is funded by the advanced technological education program and is supported in part by funds from intel corporation under the etste DCL. The program focuses on the education of technicians for the advanced-technology fields that drive the nation's economy. This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the foundation's intellectual merit and broader impacts review criteria.- subawards are not planned for this award.