Sttr phase i: scaling of ALN/GAN/ALN hemts via molecular beam epitaxy
Ended Project Grant Awarded Last action
- Award ID
- 2112247
- Recipient
-
Soctera, Inc. UEI ZZW9HEN52231
- Awarding agency
-
Division of Industrial Innovation
National Science Foundation
- Obligated
- $256,000
Award facts
- Assistance listing
- 47.041 Engineering
- Completion date
- Place of performance
- Ithaca, NY, USA
Award details come from USAspending.gov.
About this award
Soctera, Inc. received a $256,000 Small Business Technology Transfer (STTR) Phase I Project Grant award from the National Science Foundation to scale aluminum nitride/gallium nitride/aluminum nitride (AlN/GaN/AlN) high electron mobility transistors (HEMTs) using molecular beam epitaxy. The award period was from August 1, 2021 to January 31, 2022. Under the NSF's Engineering program (CFDA 47.041), which seeks to improve quality of life and economic strength through engineering research and development, Soctera will work to advance AlN/GaN/AlN HEMT technology for applications such as power electronics and high-frequency/high-power devices. The place of performance for this work is Ithaca, New York.
Quick answers
Who received award 2112247?
2112247 was awarded to Soctera, Inc. by Division of Industrial Innovation (National Science Foundation) on August 1, 2021.
How much is award 2112247 worth?
$256,000 has been obligated on 2112247.
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