Atomic Layer Deposition (ALD) Batch Reactor
NIST is conducting a sources-sought market research for an Atomic Layer Deposition Batch Reactor, with responses due by July 14, 2026. This is not a Request for Proposal, Request for Quotation, or Invitation for Bids, and no solicitation documents currently exist; submission of information is voluntary and will not obligate the Government.
NIST's Chemical Process and Nuclear Measurements Group seeks the ALD Batch Reactor to support a CHIPS R&D Metrology project focused on characterizing the stability of biofunctional semiconductor interfaces in chip-based biosensors. The reactor will fabricate test structures and devices for this application.
The relevant NAICS code is 333242 (Semiconductor Machinery Manufacturing) with a Small Business Size Standard of 1,500 employees. NIST is explicitly seeking responses from all responsible sources, including both large and small businesses. No set-aside applies to this market research.
Respondents should clearly mark any proprietary or restricted information. In the absence of such markings, NIST will assume unlimited rights to all technical data submitted. NIST will not pay for any information provided in response to this notice.
NB305000-26-01452 Department of Commerce National Institute of Standards and Technology
6/30/26, 4:38 PM Atomic Layer Deposition (ALD) Batch Reactor
The National Institute of Standards and Technology seeks quotations for one Atomic Layer Deposition batch reactor, with offers due September 21, 2026 at 9:00 AM ET. This is an unrestricted, full and open procurement using Request for Quotation procedures under FAR 52.212-1 (Instructions to Quoters-Commercial Products and Commercial Services).
Place of performance is Building 301, Room B129 at NIST's Gaithersburg, Maryland facility. The system must be delivered inclusive of warranty, shipping, delivery, installation, training, and related services. Quotations must provide a firm fixed price and detailed technical specifications addressing wafer size, heating capability, chamber uniformity, carrier gas flow control, pressure measurement, ozone generation, precursor abatement, power requirements, utility requirements, safety interlocks, chemical safety provisions, documentation, installation procedures, system training, and warranty coverage.
The solicitation clarifies several interface requirements: the existing vacuum pump inlet is NW40 with outlet either NW25 or NW40; ozone destruct and vented precursor cabinet connections must accommodate common flexible duct hoses (inner diameters of 2.5" or 3.0"); utilities are approximately 36 inches from the tool location; and chilled water is not available. FOB destination at NIST Shipping and Receiving satisfies delivery requirements; the contractor is not responsible for uncrating, rigging, cleanroom wipe-down, or final placement. NIST will supply ALD and SAM precursors for commissioning and acceptance testing.
Quoters must maintain active SAM.gov registration through contract award and performance. All quotations must be submitted electronically to Contracting Officer Sadaf Afkhami (Sadaf.Afkhami@nist.gov, 301-975-3976). NAICS code is 333242, Semiconductor Machinery Manufacturing; PSC is 5961, Semiconductor Devices And Associated Hardware.
1333ND26QNB030533 Department of Commerce National Institute of Standards and Technology
8/18/26, 3:10 PM