Pecvd is a common deposition technique used in the semiconductor industry for depositing insulating layers a system to deposit low optical loss films.evidence to control the stoichiometry & stress…
Ended Purchase Order Awarded Last action
- Contract number
- 1333ND20PNB680491
- Awardee
-
Plasma-Therm LLC UEI TPK7CJU9TJF3
- Awarding agency
-
National Institute of Standards and Technology
Department of Commerce
- Obligated
- $631,303
Award facts
- Opportunity
-
- 1333ND20QNB680450 Solicitation number
- Contract value 100% obligated
- $631,302.75 Current and potential, with all options
- Completion date 100% complete
- Current and potential, with all options
- Contracting staff
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- PSC
- 6640 Laboratory Equipment And Supplies
- Set-aside
- No set-aside
- Competition
- Not Competed under SAP · 1 offer Simplified Acquisition
- Pricing
- Firm Fixed Price
- Place of performance
- St. Petersburg, FL 33716, USA
Award details come from SAM.gov/FPDS.
Transactions
| Action | Obligated | Date |
|---|---|---|
| Funding Only Action | -$0 | |
| Original award | $631,303 |
About this award
The National Institute of Standards and Technology (NIST), a civilian agency within the Department of Commerce, awarded a $631,302.75 firm fixed price contract to Plasma-Therm LLC, a U.S.-based manufacturer of semiconductor fabrication equipment. The contract is for the delivery of a plasma-enhanced chemical vapor deposition (PECVD) system capable of depositing low optical loss films. This equipment will be used in semiconductor manufacturing processes. The contract has no set-aside designation and was awarded on August 6, 2020, with a completion date of April 2, 2021. Plasma-Therm LLC has received over $2 million in prior NIST contracts for semiconductor fabrication equipment and related services since 2019.
Description
Pecvd is a common deposition technique used in the semiconductor industry for depositing insulating layers a system to deposit low optical loss films.evidence to control the stoichiometry & stress of a film independently by using helium dilution
Quick answers
Who was awarded contract 1333ND20PNB680491?
1333ND20PNB680491 was awarded to Plasma-Therm LLC by National Institute of Standards and Technology (Department of Commerce) on August 6, 2020.
How much is contract 1333ND20PNB680491 worth?
The government has obligated $631,303 on 1333ND20PNB680491.
Was contract 1333ND20PNB680491 competed?
The extent of competition for 1333ND20PNB680491 was not competed under sap. The government received 1 offer.
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